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US 12,421,343 B2Granted
Composition for forming underlayer film for imprinting, method for producing composition for forming underlayer film, kit, pattern producing method, and method for manufacturing semiconductor element
AssigneeFUJIFILM Corporation
InventorsAkihiro Hakamata, Yuichiro Goto, Naoya Shimoju
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Abstract
Provided are: a composition for forming an underlayer film for imprinting, which contains a high-molecular-weight compound having a polymerizable group, a chelating agent, and a solvent, and a method for producing the same; a kit including the composition for forming an underlayer film; a pattern producing method using the composition for forming an underlayer film; and a method for manufacturing a semiconductor element, which includes the pattern producing method as a step.
Claims16
A composition for forming an underlayer film for imprinting, comprising:
- a high-molecular-weight compound having a polymerizable group;
- a chelating agent;
- and
- a solvent,
- wherein the chelating agent has an acid group;
- the acid group includes a carboxy group;
- and a content of the chelating agent is 10 to 10,000 ppm by mass with respect to the solids content in the composition.
4 more elements
Dependencies are inferred from the claim text.