Titanium complex, method for producing same, and method for producing titanium-containing thin film
AssigneeTosoh Corporation
InventorsShuya Ikemura, Hiroyuki Oike, Yuki Yamamoto, Teppei Hayakawa
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Abstract
A titanium complex useful for producing a titanium-containing thin film under low temperature deposition conditions without using an oxidative gas is provided. A titanium complex represented by the general formula (1) (wherein each of R1 and R2 is independently a C1-6 alkyl group which may be bonded with each other to form a ring, X is CR3 or a N atom, Y is CR4 or a N atom, Z is CR5 or a N atom, each of R3, R4 and R5 is independently a hydrogen atom or a C1-6 alkyl group, and n is an integer of from 1 to 3).
Claims9
A titanium complex represented by the general formula (1):
- wherein each of R1 and R2 is independently a C1-6 alkyl group which may be bonded with each other to form a ring, X is CR3 or a N atom, Y is CR4 or a N atom, Z is CR5 or a N atom, each of R3, R4 and R5 is independently a hydrogen atom or a C1-6 alkyl group, and n is an integer of from 1 to 3.
A method for producing a titanium-containing thin film, which comprises depositing the titanium-containing thin film by decomposing a vaporized titanium complex represented by the general formula (1) on a substrate:
- wherein each of R1 and R2 is independently a C1-6 alkyl group which may be bonded with each other to form a ring, X is CR3 or a N atom, Y is CR4 or a N atom, Z is CR5 or a N atom, each of R3, R4 and R5 is independently a hydrogen atom or a C1-6 alkyl group, and n is an integer of from 1 to 3.
Dependencies are inferred from the claim text.