Substrate alloy influence compensation
AssigneeThermo Fisher Scientific Messtechnik GmbH
InventorAlexander Britting
Life of this patent
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Abstract
A method for compensating for substrate variation in measurement of material quantity of a material positioned on a substrate is described. The method includes receiving a detected X-ray signal for a measurement of the material at a position on a surface of the substrate; and determining a material quantity based on the received X-ray measurement signal and a pre-determined set of compensation parameters for the substrate, the set of compensation parameters varying according to the position on the surface of the substrate.
Claims17
A method for compensating for substrate variation in measurement of a material positioned on a substrate, the method comprising:
- receiving a detected X-ray signal for a measurement of the material at a position on a surface of the substrate;
- and
- determining a material quantity based on the received X-ray measurement signal and a pre-determined set of compensation parameters for the substrate, the set of compensation parameters varying according to the position on the surface of the substrate, wherein the surface of the substrate has a substantially cylindrical shape, each position on the surface of the substrate being defined by a position along a width of the substrate surface and a rotational angle of the substrate.
A method for determining compensation parameters for substrate variation in measurement of material quantity of a material positioned on a substrate, the method comprising:
- obtaining at least one detected X-ray signal for each of a plurality of positions on a surface of the substrate;
- and
- establishing a set of compensation parameters for each position on the surface of the substrate, based on the respective at least one detected X-ray signal, wherein the surface of the substrate has a substantially cylindrical shape, each position on the surface of the substrate being defined by a position along a width of the substrate surface and a rotational angle of the substrate.
A method for compensating for substrate variation in measurement of a material positioned on a substrate, the method comprising:
- obtaining at least one detected X-ray signal for each of a plurality of positions on a surface of the substrate;
- and
- establishing a set of compensation parameters for each position on the surface of the substrate, based on the respective at least one detected X-ray signal;
- receiving a detected X-ray signal of the material at a position on a surface of the substrate;
- and
- determining a material quantity based on the received X-ray measurement signal and a pre-determined set of compensation parameters for the substrate, the set of compensation parameters varying according to the position on the surface of the substrate, wherein the surface of the substrate has a substantially cylindrical shape, each position on the surface of the substrate being defined by a position along a width of the substrate surface and a rotational angle of the substrate.
An X-ray analysis system for measurement of material quantity of a material positioned on a substrate, the system comprising:
- an X-ray sensor, configured for detecting an X-ray signal for a measurement of the material at a position on a surface of the substrate;
- and
- a processor for compensating for substrate variation in the measurement, the processor being configured to determine a material quantity based on the detected X-ray measurement signal and a pre-determined set of compensation parameters for the substrate, the set of compensation parameters varying according to the position on the surface of the substrate, wherein the surface of the substrate has a substantially cylindrical shape, each position on the surface of the substrate being defined by a position along a width of the substrate surface and a rotational angle of the substrate.
Dependencies are inferred from the claim text.