Fluorene derivative, and production method and use for same
AssigneeOsaka Gas Chemicals Co., Ltd.
InventorYuki Ouchi
Life of this patent
Estimating the term…
Loading patent…
AssigneeOsaka Gas Chemicals Co., Ltd.
InventorYuki Ouchi
Estimating the term…
The fluorene derivative of the present disclosure is represented by the following formula (1): Wherein R1 represents a substituent, k denotes an integer of 0 to 8, R2a, R2b, R2c, and R2d each represent a hydrogen atom or a substituent, R3a and R3b each represent a hydrogen atom or a substituent, and X1a and X1b each represent a group defined in the following formula (X1): wherein R4 and R5 each represent a hydrogen atom or an aliphatic hydrocarbon group, provided that the case where both R4 and R5 are a hydrogen atom is excluded; or R4 and R5 bond together to form a heterocyclic ring containing the nitrogen atom adjacent to R4 and R5. The present disclosure provides a novel fluorene derivative useful as an additive for improving the properties of a resin, a method for producing the same and a use thereof.
A fluorene derivative represented by the following formula (1):
Dependencies are inferred from the claim text.