Synthetic quartz glass manufacturing method through OVD process with improved deposition efficiency

An apparatus for manufacturing synthetic quartz glass, the apparatus comprising:

• a cylindrical mandrel including a deposition surface and a porous hollow cylindrical soot body having silicon dioxide (SiO2) particles on the deposition surface of the mandrel;
• a temperature measuring instrument provided above the deposition surface on which the silicon dioxide (SiO2) is deposited;
• a preheating burner provided on a side of the deposition surface;
• and
• a deposition burner provided below the deposition surface,
• wherein at least one of the temperature measuring instrument, the preheating burner, and the deposition burner is configured to move at a predetermined interval, and a position of each of the temperature measuring instrument, the preheating burner, and the deposition burner is independently controllable so as to uniformly control a temperature of the deposition surface,
• wherein the deposition burner includes a line mixing console, and
• wherein the line mixing console has multiple layers such that one of the multiple layers is configured to receive octamethylcyclotetrasiloxane ([(CH3)2SiO]4) in the form of a droplet.