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AssigneeASML Netherlands B.V.
InventorsPeter Michael Kraus, Sylvianne Dorothea Christina Roscam Abbing, Filippo Campi, ZhuangYan Zhang, Petrus Wilhelmus Smorenburg, Nan Lin, Stefan Michiel Witte, Arie Jeffrey Den Boef
Estimating the term…
Disclosed is a metrology apparatus for measurement of a target formed on a substrate by a lithographic process and associated method. The metrology apparatus comprises a radiation source operable to provide first radiation; a configured solid high harmonic generation medium being configured to receive and be excited by said first radiation to generate high harmonic second radiation from an output surface of the configured solid high harmonic generation medium; and a detection arrangement operable to detect said second radiation, at least a portion of which having been scattered by said target. The configured solid high harmonic generation medium is configured to shape the beam of said second radiation and/or separate said first and second radiation.
A metrology apparatus comprising:
A metrology method comprising:
Dependencies are inferred from the claim text.