Injector configured for arrangement within a reactor of a vertical furnace and vertical furnace
AssigneeASM IP Holding B.V.
InventorChristianus G. M. de Ridder
Life of this patent
Estimating the term…
Abstract
An injector configured for arrangement within a reactor of a vertical furnace to inject gas in the reactor is provided. The injector is made substantial elongated and configured with an internal gas conduction channel to transport gas from a first end of the injector to a second end of the injector. An outer sidewall of the injector may be tapered towards the second end over at least 10%, preferably 30% and most preferably 50% of the length of the injector to increase tolerances for fitting the injector in the tube.
Claims19
An injector configured for arrangement within a reaction chamber of a vertical furnace to inject gas in the reaction chamber, the injector is:
- substantially elongated and configured to transport gas through an internal gas conduction channel from a first end of the injector to a second end of the injector, wherein the first end and the second end are on opposite ends of a length of the injector, wherein an outer side wall of the injector is tapered towards the second end of the injector over at least 10% of the length such that a cross sectional area at the second end is 3 to 40% smaller than a cross sectional area at the first end, and wherein the outer side wall is substantially straight along a bottom portion extending from the first end and tapers along a top portion extending from the bottom portion to the second end, and
- wherein the injector is provided with a series of openings extending in the elongated direction along the length of the injector to transport gas out of the internal gas conduction channel into the reaction chamber, wherein a portion of the series of openings are provided in the bottom portion of the injector.
A vertical furnace comprising:
- a process tube provided with an opening with a closeable door to form a reaction chamber;
- a heater configured to heat the reaction chamber of the process tube;
- and,
- a wafer boat that is configured to move substrates in the reaction chamber in a vertical direction,
- wherein an injector is provided in the reaction chamber, wherein the injector is substantially elongated and configured to transport gas through an internal gas conduction channel from a first end of the injector to a second end of the injector, wherein the first end and the second end are on opposite ends of a length of the injector, wherein an outer side wall of the injector is tapered towards the second end of the injector over at least 10% of the length such that a cross sectional area at the second end is 3 to 40% smaller than a cross sectional area at the first end, and wherein the outer side wall is substantially straight along a bottom portion extending from the first end and tapers along a top portion extending from the bottom portion to the second end,
- wherein the injector is provided with a series of openings extending in the elongated direction along the length of the injector to transport gas out of the internal gas conduction channel into the reaction chamber, wherein a portion of the series of openings are provided in the bottom portion of the injector and,
- wherein the injector is supported at the first end near the opening and is directed with the second end extending along the vertical direction into the reaction chamber.
Dependencies are inferred from the claim text.