Divertless gas-dosing
AssigneeLam Research Corporation
InventorJohn Folden Stumpf
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AssigneeLam Research Corporation
InventorJohn Folden Stumpf
Estimating the term…
Various embodiments include systems and apparatuses for divertless dosing of process gases, including divertless dosing of precursor gases in deposition systems. In one example, the disclosed subject matter is a divertless, pressure-based gas-dosing system that includes a process gas inlet coupled to an inlet valve, a flow controller coupled to be downstream of the inlet valve, and a line charge-volume (LCV) coupled to be downstream of the inlet valve and the flow controller. The LCV is to receive an initial single-dose of the process gas. A pressure sensor is coupled to the LCV to determine a pressure level within the LCV and an outlet valve is pneumatically coupled to be downstream of the LCV. The outlet valve is to be coupled pneumatically on a downstream side of the outlet valve to a process chamber. Other systems, apparatuses, and methods are disclosed.
A divertless, gas-dosing system comprising:
An apparatus to supply precursor gas, the apparatus comprising:
A divertless, gas-dosing system comprising:
Dependencies are inferred from the claim text.