Purification method for fluoroolefin having structure of =CF2 or =CHF, high-purity fluoroolefin, and production method therefor
AssigneeKanto Denka Kogyo Co., Ltd.
InventorsYuka Matsuta, Korehito Kato
Life of this patent
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Abstract
Impurities are removed from a fluoroolefin having a structure of ═CF2 or ═CHF that has been obtained by a dehydrohalogenation reaction and that contains haloalkene, haloalkane, and/or haloalkyne impurities. Provided are: a method of purifying a fluoroolefin having a structure of ═CF2 or ═CHF, comprising bringing a fluoroolefin having a structure of ═CF2 or ═CHF that has been obtained by a dehydrohalogenation reaction and that contains at least one of haloalkane, haloalkene, and/or haloalkyne impurities into contact with a solid adsorbent to remove the impurities through adsorption; a high-purity fluoroolefin; and a production method therefor.
Claims12
A method of purifying 1,1,3,3,3-pentafluoropropene, comprising bringing a fluid containing 1,1,3,3,3-pentafluoropropene that has been obtained by a dehydrohalogenation reaction and that contains at least one of impurities consisting of:
- CF3—CH3;
- CF3—CH2F;
- CF3—CH═CH2;
- (Z)—CF3—CF═CHF;
- (E)—CF3—CF═CHF;
- (E)—CF3—CH═CHF;
- and
- CF3—CH2—CF3,
- into contact with a solid adsorbent to remove the impurities through adsorption.
A method of producing 1,1,3,3,3-pentafluoropropene having a purity of 99% or more, comprising bringing a fluid containing 1,1,3,3,3-pentafluoropropene that has been obtained by a dehydrohalogenation reaction and that contains at least one of impurities consisting of:
- CF3—CH3;
- CF3—CH2F;
- CF3—CH═CH2;
- (Z)—CF3—CF═CHF;
- (E)—CF3—CF═CHF;
- (E)—CF3—CH═CHF;
- and
- CF3—CH2—CF3,
- into contact with a solid adsorbent to remove the impurities through adsorption.
Dependencies are inferred from the claim text.