Substrate processing apparatus and substrate processing method

A substrate processing apparatus that forms a friction reducing film on a rear surface of a substrate, the apparatus comprising:

• a processing container configured to accommodate the substrate therein and to define a hermetically-sealed processing space;
• a heating element configured to heat the rear surface of the substrate inside the processing container;
• a supplier configured to supply a material that forms the friction reducing film toward the rear surface of the substrate inside the processing container;
• a first gas supplier configured to supply an inert gas to a peripheral edge of the substrate from a space above the substrate inside the processing container;
• a second gas supplier configured to supply the inert gas closer to a center of the substrate than the first gas supplier from a space above the substrate inside the processing;
• and
• an exhauster configured to exhaust an atmosphere of the processing space from a periphery of the substrate or a space below the substrate inside the processing container.