Patterned deposition mask formed using polymer dispersed in a liquid solvent

A method comprising:

• (a) forming a polymer dispersion layer on a substrate having one or more semiconductor light-emitting devices mounted or formed thereon, the polymer dispersion layer comprising polymer particles dispersed in a liquid solvent and being present on at least portions of the substrate or the one or more semiconductor light-emitting devices thereon;
• (b) after forming the polymer dispersion layer, drying and curing the polymer dispersion layer to form a cured polymer layer;
• (c) after curing and drying, with the cured polymer layer being present on only one or more selected, masked areas of the substrate or of the one or more light-emitting devices thereon, and with one or more other, exposed areas of the substrate or of the one or more light-emitting devices thereon lacking the cured polymer layer and remaining exposed, forming a material layer on at least the one or more exposed areas of the substrate or of the one or more light-emitting devices thereon;
• and
• (d) after forming the material layer, removing the cured polymer layer from the one or more masked areas, leaving the material layer on only the one or more exposed areas.