Charged particle beam device and sample observation method
AssigneeHitachi High-Tech Corporation
InventorsYusuke Seki, Mitsuhiro Nakamura, Keisuke Tanuma
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AssigneeHitachi High-Tech Corporation
InventorsYusuke Seki, Mitsuhiro Nakamura, Keisuke Tanuma
Estimating the term…
A dielectric microscopic observation is possible, which suppresses image flow regardless of scanning speed. There are provided a sample chamber 120 holding a sample 200 between a first insulating layer 121 on which a conductive layer 211 to be irradiated with a charged particle beam is laminated and a second insulating layer 122, an amplifier 141 that amplifies a potential change that occurs at an interface between the first insulating layer and the sample as the conductive layer is irradiated with the charged particle beam, and outputs the amplified result as a measurement signal, a main control unit 142 that converts the measurement signal from the amplifier into image data, and corrects the image data with a deconvolution filter 302 to generate corrected image data, a display unit 144 including an observation image display unit 501 and a filter adjustment unit 502 that displays setting information of the deconvolution filter, and an information processing device that displays the corrected image data on the observation image display unit, and when the setting information of the deconvolution filter displayed in the filter adjustment unit is changed, adjusts the deconvolution filter according to the changed setting information.
A charged particle beam device comprising:
A sample observation method using a charged particle beam device having a charged particle optical system and a stage, the sample observation method comprising:
Dependencies are inferred from the claim text.