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US 12,405,533 B2Granted
Resist underlayer film-forming composition containing substituted crosslinkable compound
AssigneeNissan Chemical Industries, Ltd.
InventorsKeisuke Hashimoto, Kenji Takase, Tetsuya Shinjo, Rikimaru Sakamoto, Takafumi Endo, Hirokazu Nishimaki
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Abstract
A resist underlayer film-forming composition includes a resin; and a crosslinkable compound of Formula (1) or Formula (2): wherein the crosslinkable compound of Formula (1) or Formula (2) is a compound obtained by reacting a compound of Formula (3) or Formula (4): with an ether compound comprising a hydroxy group or a C2-10 alcohol.
Claims2
A resist underlayer film-forming composition comprising:
- a resin, wherein the resin is a novolac resin obtained by condensing an aromatic ring-containing compound with an aldehyde compound or a ketone compound, wherein the aromatic ring-containing compound is selected from the group consisting of benzene, naphthalene, phloroglucinol, hydroxynaphthalene, fluorene, carbazole, bisphenol, bisphenol S, diphenylamine, triphenylamine, phenylnaphthylamine, anthracene, hydroxyanthracene, phenothiazine, phenoxazine and phenylindole;
- a crosslinkable compound,
- wherein the crosslinkable compound is selected from the group consisting of
- and
- an acid catalyst, wherein the acid catalyst is one or more of p-toluenesulfonic acid, trifluoromethanesulfonic acid, pyridinium p-toluenesulfonate, salicylic acid, 5-sulfosalicylic acid, 4-phenolsulfonic acid, 4-chlorobenzenesulfonic acid, benzenedisulfonic acid, 1-naphthalenesulfonic acid, citric acid, benzoic acid, hydroxybenzoic acid, and naphthalene carboxylic acid.
2 more elements
A resist underlayer film-forming composition comprising:
- a novolac resin, wherein the novolac resin is obtained by reacting an aromatic ring-containing compound with an aldehyde compound or a ketone compound, the aromatic ring-containing compound being at least one selected from the group consisting of benzene, naphthalene, fluorene, carbazole, diphenylamine, triphenylamine, phenylnaphthylamine, anthracene, phenothiazine, phenoxazine, and phenylindole;
- the aldehyde compound being at least one selected from the group consisting of acetaldehyde, propylaldehyde, butyraldehyde, isobutyraldehyde, valeraldehyde, capronaldehyde, 2-methylbutyraldehyde, hexylaldehyde, undecanealdehyde, 7-methoxy-3,7-dimethyloctylaldehyde, cyclohexanealdehyde, 3-methyl-2-butyraldehyde, glyoxal, malonaldehyde, succinaldehyde, glutaraldehyde, adipaldehyde, heterocyclic aldehydes and aromatic aldehydes;
- and
- a crosslinkable compound selected from the group consisting of
1 more element
Dependencies are inferred from the claim text.