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US 12,405,527 B2Granted
Photomask, method of fabricating a photomask, and method of fabricating a semiconductor structure using a photomask
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsTzu Han Liu, Chih-Wei Wen, Chung-Hung Lin
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Abstract
The present disclosure provides a photomask and a method for fabricating a semiconductor structure with a photomask. The photomask includes a substrate, and a polymer layer over a surface of the substrate, wherein the polymer layer includes a thermoplastic polymer and a hydrophobic layer, wherein the thermoplastic polymer is between the hydrophobic layer and the surface of the photomask.
Claims20
A photomask, comprising:
- a substrate;
- a patterned layer over a first surface of the substrate;
- and
- a polymer multilayer over a second surface of the substrate, wherein the polymer multilayer comprises a thermoplastic polymer and a hydrophobic layer, wherein the thermoplastic polymer is between the hydrophobic layer and the second surface of the photomask,
- wherein the polymer multilayer further comprises an adhesive layer between the thermoplastic polymer and the second surface of the substrate.
2 more elements
A photomask, comprising:
- a substrate;
- a patterned layer over a first surface of the substrate;
- and
- a first film over a second surface of the substrate, comprising:
- an adhesive layer, wherein the adhesive layer comprises a conductive dopant consisting of a metallic ion or graphene;
- a thermoplastic layer over the adhesive layer;
- and
- a hydrophobic layer over the thermoplastic layer.
5 more elements
A method for fabricating a semiconductor structure with an extreme ultraviolet (EUV) photomask, comprising:
- placing a substrate over a supporter;
- forming a photoresist layer over the substrate;
- patterning the photoresist layer with an actinic radiation reflected off an EUV photomask, wherein a protective film is disposed on the EUV photomask, and the protective film comprises:
- a thermoplastic polymer and a hydrophobic layer, wherein the thermoplastic polymer is between the hydrophobic layer and a surface of the photomask, wherein protective film further comprises an adhesive layer facing the photomask.
1 more element
Dependencies are inferred from the claim text.