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US 12,403,696 B2Granted
Trap device and substrate processing apparatus comprising the same
AssigneeSemes Co., Ltd.
InventorJin Woo Yang
Life of this patent
Estimating the term…
Abstract
The present disclosure provides a substrate processing apparatus capable of stably controlling a meniscus position. The substrate processing apparatus comprises a head unit configured to discharge a medical fluid; a reservoir configured to store the medical fluid and supply the medical fluid to the head unit; a pressure control unit configured to control pressure in the reservoir; and a trap unit disposed between the reservoir and the pressure control unit and configured to trap a mist generated by the reservoir.
Claims9
A substrate processing apparatus, comprising:
- a head unit configured to discharge a medical fluid;
- a reservoir configured to store the medical fluid and supply the medical fluid to the head unit;
- a pressure control unit configured to control pressure in the reservoir;
- and
- a trap unit disposed between the reservoir and the pressure control unit and configured to trap a mist generated by the reservoir,
- wherein the trap unit comprises;
- a body,
- a first line installed in the body, connected to the reservoir and extending in a first direction,
- a second line installed in the body, connected to the pressure control unit and extending in a second direction,
- a third line installed from an upper surface of the body to penetrate the first line and the second line,
- a trap layer configured to trap the mist is installed on an inner wall of the first line or an inner wall of the second line, and
- a cover installed on the upper surface of the body to open or seal one side of the third line.
9 more elements
Dependencies are inferred from the claim text.