Laser processing apparatus and laser processing method

A laser processing apparatus comprising:

• a laser oscillator configured to oscillate processing laser light to be incident on a processing point on a processing surface of a workpiece;
• a coupling mirror configured to deflect or transmit the processing laser light and measurement light to be incident on the processing point toward the processing point;
• a measurement light deflection unit configured to change an incident angle of the measurement light on the coupling mirror;
• a lens configured to concentrate the processing laser light and the measurement light on the processing point;
• a controller configured to control the laser oscillator and the measurement light deflection unit;
• a measurement processor configured to measure a depth of a keyhole generated at the processing point by the processing laser light by using an optical interference signal based on an interference generated by an optical path difference between the measurement light reflected at the processing point and reference light;
• a beam position measurement unit configured to measure positions of the processing laser light and the measurement light;
• and
• a first mirror configured to change a travel direction of the processing laser light and the measurement light,
• wherein the controller further controls the first mirror based on processing data.

A laser processing apparatus comprising:

• a laser oscillator configured to oscillate processing laser light to be incident on a processing point on a processing surface of a workpiece;
• a coupling mirror configured to deflect or transmit the processing laser light and measurement light to be incident on the processing point toward the processing point;
• a measurement light deflection unit configured to change an incident angle of the measurement light on the coupling mirror;
• a lens configured to concentrate the processing laser light and the measurement light on the processing point;
• a controller configured to control the laser oscillator and the measurement light deflection unit;
• a measurement processor configured to measure a depth of a keyhole generated at the processing point by the processing laser light by using an optical interference signal based on an interference generated by an optical path difference between the measurement light reflected at the processing point and reference light;
• and
• a beam position measurement unit configured to measure positions of the processing laser light and the measurement light, wherein:
• the beam position measurement unit derives a relative position of an optical axis of the measurement light with respect to an optical axis of the processing laser light, and
• the controller controls the coupling mirror having an angle adjusting function or the measurement light deflection unit based on the relative position derived by the beam position measurement unit.