Co-integrated resonant tunneling diode and field effect transistor

A semiconductor device comprising:

• a resonant tunneling diode and a field effect transistor co-integrated in a common layer extending along an insulating layer of a substrate, wherein the resonant tunneling diode is directly adjacent to the field effect transistor, wherein the resonant tunneling diode comprises a first group of layers arranged in a first order, wherein each layer of the first group of layers is directly adjacent to and extends in a normal direction from a surface of the insulating layer of the substrate, wherein the field effect transistor comprises a second group of layers arranged in a second order, wherein each layer of the second group of layers is directly adjacent to and extends in the normal direction from the surface of the insulating layer of the substrate, wherein the first order of the first group of layers comprises in sequential order a collector layer, a first quantum well layer, a second quantum well layer, and an emitter layer, wherein the second order of the second group of layers comprises in sequential order a source layer, a channel layer, and a drain layer, and wherein a layer at one end of the first order of the first group of layers of the resonant tunneling diode is directly adjacent to a layer at one end of the second order of the second group of layers of the field effect transistor.