Deposition apparatus, method of deposition on a substrate, substrate structure and substrate support
AssigneeApplied Materials Italia S.R.L.
InventorsFrancesca Antoniolli, Marco D'Acunzo, Marco Galiazzo, Daniel Hada
Life of this patent
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Abstract
A deposition apparatus includes a first substrate support for supporting a substrate in a substantially vertical orientation. The substrate has a first main surface, a second main surface opposite the first main surface and a side surface between the first main surface and the second main surface. The deposition apparatus includes a first deposition device for depositing a first conductive pattern or a first resist mask on the side surface of the substrate while the substrate is supported in the substantially vertical orientation by the first substrate support.
Claims9
A deposition apparatus, comprising:
- a first substrate support for supporting a substrate in a substantially vertical orientation, the substrate having a first main surface, a second main surface opposite the first main surface and a side surface between the first main surface and the second main surface;
- and
- a first deposition device for depositing a first conductive pattern or a first resist mask on the side surface of the substrate while the substrate is supported in the substantially vertical orientation by the first substrate support.
A method of deposition on a substrate, comprising:
- providing a substrate in a substantially vertical orientation, the substrate having a first main surface, a second main surface opposite the first main surface and a side surface between the first main surface and the second main surface, the side surface being a surface at a top portion of the substrate and having a width corresponding to a thickness of the substrate;
- and
- printing a first conductive pattern or a first resist mask on the side surface of the substrate while the substrate is in the substantially vertical orientation.
Dependencies are inferred from the claim text.