Apparatus for manufacturing display apparatus and method of manufacturing display apparatus
AssigneesSamsung Display Co., Ltd., Tes Co., Ltd, Ltc Co., Ltd.
InventorsGugrae Jo, Hyoungsik Kim, Woojin Cho, Jongsoon Lee, Hongjae Lee, Kyusang Kim, Seonjeong Kim, Heejeon Ma, Wonil Park, Kicheon Byun, Woojin Lee
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Abstract
A method of manufacturing a display apparatus, the method includes removing an oxide layer formed on a surface of a substrate by utilizing a hydrofluoric acid gas and an ammonia gas, and thermally treating the substrate from which the oxide layer has been removed. A flow ratio between the hydrofluoric acid gas and the ammonia gas is about 0.8:1 to about 1:1.
Claims27
A method of manufacturing a display apparatus, the method comprising:
- removing an oxide layer by providing a hydrofluoric acid-ammonia mixture gas to a substrate on which the oxide layer is formed;
- and
- thermally treating the substrate from which the oxide layer has been removed,
- wherein the removing of the oxide layer is performed at a process pressure of about 400 mTorr to about 600 mTorr, and
- wherein the thermally treating of the substrate is performed at a temperature of about 150° C. to about 350° C.
A method of manufacturing a display apparatus, the method comprising:
- removing an oxide layer formed on a surface of a substrate by utilizing a hydrofluoric acid gas and an ammonia gas;
- and
- thermally treating the substrate from which the oxide layer has been removed,
- wherein a flow ratio between the hydrofluoric acid gas and the ammonia gas is about 0.8:1 to about 1:1, and
- wherein the removing of the oxide layer is performed at a process pressure of about 400 m Torr to about 600 m Torr.
An apparatus for manufacturing a display apparatus, the apparatus comprising:
- a first chamber configured to remove an oxide layer formed on a surface of a substrate;
- a first supply line that separately supplies a hydrofluoric acid gas and an ammonia gas to an inside of the first chamber;
- a first shower head configured to spray the hydrofluoric acid gas and the ammonia gas received from the first supply line toward the substrate;
- a first gas diffusion plate arranged between the first supply line and the first shower head;
- a stage on which the substrate is seated;
- and
- a first pressure adjuster configured to adjust an internal pressure of the first chamber to have a process pressure of about 400 mTorr to about 600 mTorr during the removing of the oxide layer,
- wherein the apparatus is configured to mix the hydrofluoric acid gas and the ammonia gas the inside the first chamber.
Dependencies are inferred from the claim text.