Substrate process apparatus and substrate process method using the same
AssigneeSamsung Electronics Co., Ltd.
InventorsJaehyun Park, Jingoo Lee
Life of this patent
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Abstract
A substrate process apparatus includes a chamber body providing a process space and a chamber lid coupled to the chamber body, the chamber lid includes a focus adapter providing a diffusion space of which width increases in a direction approaching a bottom of the focus adapter, a lid body surrounding the focus adapter, and a coupling adapter supporting the focus adapter, the lid body provides a coupling through hole recessed downwardly from an upper surface of the lid body, the coupling adapter provides a coupling recess recessed downwardly from an upper surface of the coupling adapter, and the coupling recess is spaced apart outwardly from the diffusion space and is located below the coupling through hole.
Claims20
A substrate process apparatus comprising:
- a chamber body providing a process space;
- and
- a chamber lid coupled to the chamber body,
- wherein the chamber lid includes:
- a focus adapter providing a diffusion space of which width increases in a direction approaching a bottom of the focus adapter;
- a lid body surrounding the focus adapter;
- and
- a coupling adapter supporting the focus adapter,
- wherein the lid body provides a coupling through hole recessed downwardly from an upper surface of the lid body,
- wherein the coupling adapter provides a coupling recess recessed downwardly from an upper surface of the coupling adapter, and
- wherein the coupling recess is spaced apart outwardly from the diffusion space and is located below the coupling through hole.
A substrate process apparatus comprising:
- a chamber body defining a process space configured such that a substrate is disposed in the process space;
- and
- a chamber lid on the chamber body,
- wherein the chamber lid includes:
- a focus adapter defining a diffusion space connected to the process space;
- a lid body surrounding the focus adapter;
- and
- a coupling adapter fixing the focus adapter to the lid body,
- wherein the coupling adapter includes:
- a support ring;
- and
- a plurality of support blocks protruding inwardly from the support ring,
- wherein the plurality of support blocks are spaced apart from each other in a circumferential direction along the support ring, and
- wherein the focus adapter is positioned on the plurality of support blocks.
A substrate process method comprising:
- placing a substrate in a substrate process apparatus;
- supplying a gas to the substrate process apparatus;
- generating plasma using the gas supplied to the substrate process apparatus;
- and
- processing the substrate with the plasma,
- wherein the substrate process apparatus includes:
- a chamber body providing a process space in which the substrate is disposed;
- and
- a chamber lid on the chamber body,
- wherein the chamber lid includes:
- a focus adapter providing a diffusion space in which the plasma is diffused;
- a lid body surrounding the focus adapter;
- and
- a coupling adapter supporting the focus adapter,
- wherein the lid body provides a coupling through hole connected to an upper surface of the lid body, and
- wherein the coupling adapter provides a coupling recess positioned below the coupling through hole.
Dependencies are inferred from the claim text.