Process, system, and software for maskless lithography systems
AssigneeApplied Materials, Inc.
InventorsZheng Gu, Yujiao Huang, Deepthy M. George
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Abstract
Embodiments of the systems, methods, and software provided herein patterns substrates using digital lithography patterning controlled by field programmable gate arrays (FPGA). Stage position data is provided to the FPGA from the lithography environment and the data is loaded into a memory from the FPGA. The graphics processing unit, reads the data from the memory and calculates instructions based on the data. At least a portion of a substrate disposed on the stage is processed using instructions provided by the FPGA.
Claims20
A method of patterning a substrate, comprising:
- providing data from a lithography system to a field programmable gate array (FPGA);
- loading the data into a memory from the FPGA;
- computing the data from the memory by a graphics processing unit (GPU);
- providing instructions to the FPGA from the data from the GPU;
- and
- patterning at least a portion of a substrate disposed on a stage using the instructions provided by the FPGA.
A non-transitory computer-readable medium storing instructions that, when executed by a processor, cause a computer system to perform the steps of:
- providing data from a lithography system to a field programmable gate array (FPGA);
- loading the data into a memory from the FPGA;
- computing the data from the memory by a GPU;
- providing instructions to the FPGA from the data from the GPU;
- and
- patterning at least a portion of a substrate disposed on a stage using the instructions provided by the FPGA.
A digital lithography system comprising:
- a processor;
- and
- a memory storing instruction which when executed by the processor perform a method for patterning of a substrate, the method comprising:
- sensing at least one attribute of a stage of a lithography system;
- inputting the at least one attribute to an FPGA;
- loading the at least one attribute into a memory from the FPGA;
- reading the at least one attribute from the memory by a GPU;
- calculating a set of instructions based on the at least one attribute using the GPU;
- and
- patterning at least a portion of a substrate disposed on the stage using the instructions provided by the FPGA.
Dependencies are inferred from the claim text.