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US 12,399,390 B2Granted
Photonic integrated circuit, opto-electronic system and method
AssigneeEffect Photonics B.V.
InventorsNiall Patrick Kelly, Irina Kulkova, Tommaso Lunghi
Life of this patent
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Abstract
A PIC that includes an InP-based polarization rotator having an improved design that enables at least one of an improved performance and an improved yield of the PIC due to at least one of reduced variations in critical dimensions of the InP-based polarization rotator and reduced overlay errors during fabrication of the InP-based polarization rotator of the PIC. An opto-electronic system including said PIC. A method of fabricating the PIC that includes the InP-based polarization rotator having the improved design.
Claims15
A photonic integrated circuit, PIC, comprising:
- an InP-based polarization rotator that has a support substrate, the InP-based polarization rotator comprising an elongated InP-based optical waveguide that comprises:
- a first InP-based cladding layer that is at least a part of the support substrate or an epitaxial InP-based layer that is arranged to at least partially cover the support substrate;
- an InP-based core layer that is arranged to cover the first InP-based cladding layer;
- and
- a second InP-based cladding layer that is arranged to at least partially cover the InP-based core layer;
- wherein the elongated InP-based optical waveguide is configured and arranged to have:
- a first waveguide section that comprises:
- a first portion that has a first end part and a second end part, wherein:
- at least the first InP-based cladding layer and a first part of the InP-based core layer that is arranged in contact with the first InP-based cladding layer have a first width profile, WP1, as seen in a direction transverse to the elongated InP-based optical waveguide and parallel to the support substrate, the first width profile, WP1, having a first value, W1, that is constant;
- the second InP-based cladding layer or the second InP-based cladding layer and a second part of the InP-based core layer that is arranged in contact with both the first part of the InP-based core layer and the second InP-based cladding layer have a second width profile, WP2, as seen in the direction transverse to the elongated InP-based optical waveguide and parallel to the support substrate, the second width profile, WP2, having:
- a second value, W2, at the first end part of the first portion, the second value, W2 being smaller than the first value, W1, of the first width profile, WP1;
- and
- a third value, W3, at the second end part of the first portion, the third value, W3, being larger than the second value, W2, and smaller than the first value, W1, of the first width profile, WP1;
- and
- the first width profile, WP1, and the second width profile, WP2, are configured and arranged to provide the first portion with a hybridization region in which the elongated InP-based optical waveguide has effective refractive index values along a hybridization length, Lh, as seen in a direction parallel to the elongated InP-based optical waveguide, said effective refractive index values enabling a conversion of a lower order TM mode into a higher order TE mode in the hybridization region with a mode conversion loss of at most −10 dB;
- a second portion having a third end part and a fourth end part that is arranged in optical connection with the first end part of said first portion, wherein:
- at least the first InP-based cladding layer and said first part of the InP-based core layer have a third width profile, WP3, as seen in the direction transverse to the elongated InP-based optical waveguide and parallel to the support substrate, the third width profile, W3, having:
- a fourth value, W4, at the third end part of the second portion, the fourth value, W4, being smaller than the first value, W1, of the first width profile, WP1, in the first portion;
- and
- a fifth value, W5, at the fourth end part of the second portion, the fifth value, W5, being equal to the first value, W1, of the first width profile, WP1, in the first portion;
- and
- the second InP-based cladding layer or the second InP-based cladding layer and said second part of the InP-based core layer have a fourth width profile, WP4, as seen in the direction transverse to the elongated InP-based optical waveguide and parallel to the support substrate, the fourth width profile, WP4, having:
- a sixth value, W6, at the third end part of the second portion, the sixth value, W6, being equal to the fourth value, W4, of the third width profile, WP3;
- and
- a seventh value, W7, at the fourth end part of the second portion, the seventh value, W7, being equal to the second value, W2, of the second width profile, WP2, in the first portion;
- and
- a third portion having a fifth end part that is arranged in optical connection with the second end part of said first portion, and a sixth end part, wherein:
- at least the first InP-based cladding layer and said first part of the InP-based core layer have a fifth width profile, WP5, as seen in the direction transverse to the elongated InP-based optical waveguide and parallel to the support substrate, the fifth width profile, WP5, having:
- an eighth value, W8, at the fifth end part of the third portion, the eighth value, W8, being equal to the first value, W1, of the first width profile, WP1, in the first portion;
- and
- a ninth value, W9, at the sixth end part of the third portion, the ninth value, W9, being smaller than the eighth value, W8, and larger than the fourth value, W4, of the third width profile, WP3, in the second portion;
- and
- the second InP-based cladding layer or the second InP-based cladding layer and said second part of the InP-based core layer have a sixth width profile, WP6, as seen in the direction transverse to the elongated InP-based optical waveguide and parallel to the support substrate, the sixth width profile, WP6, having:
- a tenth value, W10, at the fifth end part of the third portion, the tenth value, W10, being equal to the third value, W3, of the second width profile, WP2, in the first portion;
- and
- an eleventh value, W11, at the sixth end part of the third portion, the eleventh value, W11, being equal to the ninth value, W9, of the fifth width profile, WP5;
- a second waveguide section that comprises a seventh end part, an eighth end part that is arranged in optical connection with the third end part of the second portion of the first waveguide section, and a first cross-section that is symmetrical as seen in a direction transverse to both the elongated InP-based optical waveguide and the support substrate, the first cross-section allowing the second waveguide section to support at least one of TM0, TE0, TM1 and TE1 modes;
- and
- a third waveguide section that comprises a ninth end part that is arranged in optical connection with the sixth end part of the third portion of the first waveguide section, a tenth end part, and a second cross-section that is symmetrical as seen in the direction transverse to both the elongated InP-based optical waveguide and the support substrate, the second cross-section allowing the third waveguide section to support at least one of TM0, TE0, TM1 and TE1 modes.
36 more elements
A method of fabricating a PIC that comprises an InP-based polarization rotator that has a support substrate, the InP-based polarization rotator comprising an elongated InP-based optical waveguide that comprises:
- a first InP-based cladding layer that is at least a part of the support substrate or an epitaxial InP-based layer that is arranged to at least partially cover the support substrate;
- an InP-based core layer that is arranged to cover the first InP-based cladding layer;
- and
- a second InP-based cladding layer that is arranged to at least partially cover the InP-based core layer;
- wherein the elongated InP-based optical waveguide is configured and arranged to have:
- a first waveguide section that comprises:
- a first portion that has a first end part and a second end part, wherein:
- at least the first InP-based cladding layer and a first part of the InP-based core layer that is arranged in contact with the first InP-based cladding layer have a first width profile, WP1, as seen in a direction transverse to the elongated InP-based optical waveguide and parallel to the support substrate, the first width profile, WP1, having a first value, W1, that is constant;
- the second InP-based cladding layer or the second InP-based cladding layer and a second part of the InP-based core layer that is arranged in contact with both the first part of the InP-based core layer and the second InP-based cladding layer have a second width profile, WP2, as seen in the direction transverse to the elongated InP-based optical waveguide and parallel to the support substrate, the second width profile, WP2, having:
- a second value, W2, at the first end part of the first portion, the second value, W2 being smaller than the first value, W1, of the first width profile, WP1;
- and
- ▪ a third value, W3, at the second end part of the first portion, the third value, W3, being larger than the second value, W2, and smaller than the first value, W1, of the first width profile, WP1;
- and
- the first width profile, WP1, and the second width profile, WP2, are configured and arranged to provide the first portion with a hybridization region in which the elongated InP-based optical waveguide has effective refractive index values along a hybridization length, Lh, as seen in a direction parallel to the elongated InP-based optical waveguide, said effective refractive index values enabling a conversion of a lower order TM mode into a higher order TE mode in the hybridization region with a mode conversion loss of at most −10 dB;
- a second portion having a third end part and a fourth end part that is arranged in optical connection with the first end part of said first portion, wherein:
- at least the first InP-based cladding layer and said first part of the InP-based core layer have a third width profile, WP3, as seen in the direction transverse to the elongated InP-based optical waveguide and parallel to the support substrate, the third width profile, W3, having:
- a fourth value, W4, at the third end part of the second portion, the fourth value, W4, being smaller than the first value, W1, of the first width profile, WP1, in the first portion;
- and
- a fifth value, W5, at the fourth end part of the second portion, the fifth value, W5, being equal to the first value, W1, of the first width profile, WP1, in the first portion;
- and
- the second InP-based cladding layer or the second InP-based cladding layer and said second part of the InP-based core layer have a fourth width profile, WP4, as seen in the direction transverse to the elongated InP-based optical waveguide and parallel to the support substrate, the fourth width profile, WP4, having:
- a sixth value, W6, at the third end part of the second portion, the sixth value, W6, being equal to the fourth value, W4, of the third width profile, WP3;
- and
- a seventh value, W7, at the fourth end part of the second portion, the seventh value, W7, being equal to the second value, W2, of the second width profile, WP2, in the first portion;
- and
- a third portion having a fifth end part that is arranged in optical connection with the second end part of said first portion, and a sixth end part, wherein:
- at least the first InP-based cladding layer and said first part of the InP-based core layer have a fifth width profile, WP5, as seen in the direction transverse to the elongated InP-based optical waveguide and parallel to the support substrate, the fifth width profile, WP5, having:
- an eighth value, W8, at the fifth end part of the third portion, the eighth value, W8, being equal to the first value, W1, of the first width profile, WP1, in the first portion;
- and
- a ninth value, W9, at the sixth end part of the third portion, the ninth value, W9, being smaller than the eighth value, W8, and larger than the fourth value, W4, of the third width profile, WP3, in the second portion;
- and
- the second InP-based cladding layer or the second InP-based cladding layer and said second part of the InP-based core layer have a sixth width profile, WP6, as seen in the direction transverse to the elongated InP-based optical waveguide and parallel to the support substrate, the sixth width profile, WP6, having:
- a tenth value, W10, at the fifth end part of the third portion, the tenth value, W10, being equal to the third value, W3, of the second width profile, WP2, in the first portion;
- and
- an eleventh value, W11, at the sixth end part of the third portion, the eleventh value, W11, being equal to the ninth value, W9, of the fifth width profile, WP5;
- a second waveguide section that comprises:
- a seventh end part;
- an eighth end part that is arranged in optical connection with the third end part of the second portion of the first waveguide section;
- and
- a first cross-section that is symmetrical as seen in a direction transverse to both the elongated InP-based optical waveguide and the support substrate, the first cross-section allowing the second waveguide section to support at least one of TM0, TE0, TM1 and TE1 modes;
- wherein:
- at least the first InP-based cladding layer and said first part of the InP-based core layer of the second waveguide section have a seventh width profile, WP7, as seen in the direction transverse to the elongated InP-based optical waveguide and parallel to the support substrate, the seventh width profile, WP7, having a twelfth value, W12, that is equal to the fourth value, W4, of the third width profile, WP3, at the third end part of the second portion of the first waveguide section;
- and
- the second InP-based cladding layer or the second InP-based cladding layer and said second part of the InP-based core layer of the second waveguide section have an eighth width profile, WP8, as seen in the direction transverse to the elongated InP-based optical waveguide and parallel to the support substrate, the eighth width profile, WP8, having a thirteenth value, W13, that is equal to the sixth value, W6, of the fourth width profile, WP4, at the third end part of the second portion of the first waveguide section;
- and
- a third waveguide section that comprises:
- a ninth end part that is arranged in optical connection with the sixth end part of the third portion of the first waveguide section;
- a tenth end part;
- and
- a second cross-section that is symmetrical as seen in the direction transverse to both the elongated InP-based optical waveguide and the support substrate, the second cross-section allowing the third waveguide section to support at least one of TM0, TE0, TM1 and TE1 modes;
- wherein:
- at least the first InP-based cladding layer and said first part of the InP-based core layer of the third waveguide section have a ninth width profile, WP9, as seen in the direction transverse to the elongated InP-based optical waveguide and parallel to the support substrate, the ninth width profile, WP9, having a fourteenth value, W14, that is equal to the ninth value, W9, of the fifth width profile, WP5, at the sixth end part of the third portion of the first waveguide section;
- and
- the second InP-based cladding layer or the second InP-based cladding layer and said second part of the InP-based core layer of the third waveguide section has a tenth width profile, WP10, as seen in the direction transverse to the elongated InP-based optical waveguide and parallel to the support substrate, the tenth width profile, WP10, having a fifteenth value, W15, that is equal to the eleventh value, W11, of the sixth width profile, WP6, at the sixth end part of the third portion of the first waveguide section;
- wherein the method comprises:
- providing the support substrate, said first InP-based cladding layer, said InP-based core layer, and said second InP-based cladding layer for the elongated InP-based optical waveguide of the InP-based polarization rotator;
- providing a first masking layer to cover the second InP-based cladding layer or at least one protection layer that is arranged to cover the second InP-based cladding layer;
- applying a first lithographic process to the first masking layer to provide the first masking layer with a first pattern that comprises, as seen in the direction parallel to the support substrate, consecutively said eighth width profile, WP8, of the second waveguide section, said fourth width profile, WP4, said second width profile, WP2, and said sixth width profile, WP6, of the first waveguide section, and said tenth width profile, WP10, of the third waveguide section of the elongated InP-based optical waveguide, thereby obtaining:
- areas of the second InP-based cladding layer or said at least one protection layer that is arranged to cover the second InP-based cladding layer that are covered with the first masking layer that is shaped in accordance with the first pattern;
- and
- uncovered areas of the second InP-based cladding layer or said at least one protection layer that is arranged to cover the second InP-based cladding layer;
- applying a first dry etch to the first masking layer and the uncovered areas of the second InP-based cladding layer or said at least one protection layer that is arranged to cover the second InP-based cladding layer for transferring the first pattern to at least one of the second InP-based cladding layer and the second part of the InP-based core layer that is arranged in contact with the second InP-based cladding layer, thereby obtaining:
- an etched first masking layer;
- and
- first etched areas of InP-based material at a first etch depth, d1, relative to the unetched areas of the second InP-based cladding layer or said at least one protection layer that is arranged to cover the second InP-based cladding layer;
- removing the etched first masking layer from unetched areas of the second InP-based cladding layer or said at least one protection layer that is arranged to cover the second InP-based cladding layer;
- providing a second masking layer to cover the first etched areas of InP-based material and the unetched areas of the second InP-based cladding layer or said at least one protection layer that is arranged to cover the second InP-based cladding layer;
- applying a second lithographic process to the second masking layer to provide the second masking layer with a second pattern that comprises, as seen in the direction parallel to said eighth width profile, WP8, of the second waveguide section, said fourth width profile, WP4, said second width profile, WP2, and said sixth width profile, WP6, of the first waveguide section, and said tenth width profile, WP10, of the third waveguide section of the elongated InP-based optical waveguide, consecutively said seventh width profile, WP7, of the second waveguide section, said third width profile, WP3, said first width profile, WP1, and said fifth width profile, WP5, of the first waveguide section, and said ninth width profile, WP9, of the third waveguide section of the elongated InP-based optical waveguide, thereby obtaining:
- the second masking layer that is shaped in accordance with the second pattern covering:
- at least parts of the unetched areas of the second InP-based cladding layer or said at least one protection layer that is arranged to cover the second InP-based cladding layer;
- and
- parts of the first etched areas of InP-based material;
- uncovered parts of the first etched areas of InP-based material;
- and
- uncovered parts of the unetched areas of the second InP-based cladding layer or said at least one protection layer that is arranged to cover the second InP-based cladding layer if the second masking layer that is shaped in accordance with the second pattern partially covers the unetched areas of the second InP-based cladding layer or said at least one protection layer that is arranged to cover the second InP-based cladding layer;
- applying a second dry etch to:
- the second masking layer;
- the uncovered parts of the first etched areas of InP-based material;
- and
- the uncovered parts of the unetched areas of the second InP-based cladding layer or said at least one protection layer that is arranged to cover the second InP-based cladding layer if the second masking layer that is shaped in accordance with the second pattern partially covers the unetched areas of the second InP-based cladding layer or said at least one protection layer that is arranged to cover the second InP-based cladding layer;
- for transferring the second pattern to at least the first InP-based cladding layer and said first part of the InP-based core layer, thereby obtaining:
- an etched second masking layer;
- and
- second etched areas of InP-based material at a second etch depth, d2, relative to the unetched areas of the second InP-based cladding layer or said at least one protection layer that is arranged to cover the second InP-based cladding layer, the second etch depth, d2, being larger than the first etch depth, d1.
81 more elements
Dependencies are inferred from the claim text.