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US 12,394,604 B2Granted
Plasma source with floating electrodes
AssigneeApplied Materials, Inc.
InventorsQuoc Truong, Dmitry A. Dzilno, Robert B. Moore
Life of this patent
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Abstract
A plasma source assembly for use with a substrate processing chamber is described. The assembly includes a spring which is disposed between electrodes and a dielectric ring.
Claims18
A plasma source assembly comprising:
- a first electrode comprising a conductive plate having a top surface, a bottom surface, and an outer peripheral edge;
- a second electrode comprising a conductive plate having a top surface, a bottom surface, and an outer peripheral edge;
- a dielectric spacer separating the first electrode and the second electrode and disposed at the outer peripheral edge of the first electrode and the outer peripheral edge of the second electrode;
- a power feed electrically connected to the first electrode and the second electrode;
- and
- a first helical spring having a shape of a ring disposed between the bottom surface of the first electrode and the dielectric spacer and adjacent to the outer peripheral edge of the first electrode;
- and
- a second helical spring in the shape of a ring disposed between the top surface of the second electrode and the dielectric spacer and adjacent to the outer peripheral edge of the second electrode, wherein each of the first helical spring and the second helical spring comprises a conductive material.
5 more elements
Dependencies are inferred from the claim text.