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US 12,391,558 B2Granted
Silicon-containing film forming composition and method for manufacturing silicon-containing film using the same
AssigneeMerck Patent GmbH
InventorsNaoko Nakamoto, Hideyuki Takagishi, Takashi Fujiwara, Atsuhiko Sato
Life of this patent
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Abstract
[Problem] According to the present invention, a silicon-containing film forming composition having a high affinity for a substrate can be provided. [Means for Solution] A silicon-containing film forming composition comprising (I) a polymer having a polysilane skeleton comprising a particular repeating unit. (II) a carbodiimide compound having a particular structure, and (III) a solvent.
Claims17
A silicon-containing film forming composition comprising:
- (I) a polymer having a polysilane skeleton comprising a repeating unit represented by the formula (ia):
- wherein
- Ra is each independently a single bond, hydrogen, halogen, C1-6 alkyl, C6-10 aryl or —SiRA3 (where RA is each independently hydrogen or C1-8 alkyl), and
- p is an integer of 5 or more;
- (II) a carbodiimide compound represented by the formula (ii):
- wherein
- R1 and R2 are each independently hydrogen, a mono- to trivalent, C1-30, linear, branched or cyclic, saturated or unsaturated aliphatic hydrocarbon group, a mono- to trivalent, C6-30 aromatic hydrocarbon group, or —SiRz3 (where Rz is each independently a mono- or divalent, C1-8 aliphatic hydrocarbon group), where R1 and R2 can be bonded each other to form a ring structure;
- and
- (III) a solvent.
6 more elements
Dependencies are inferred from the claim text.