Imprint method and method for manufacturing article

A method for manufacturing an article comprising:

• a first pattern forming process of arranging an imprint material on a first pattern forming region on a substrate and bringing a mold having a pattern into contact with the imprint material on the first pattern forming region on a substrate such that a first pattern is formed on the first pattern forming region and a portion of protruding imprint material is formed outside of the first pattern forming region;
• a first exposure process of exposing the imprint material on the first pattern forming region in which the first pattern has been formed by the first pattern forming process and making an amount of exposure for the imprint material on a partial region of the first pattern forming region smaller than an amount of exposure for the imprint material on the other region of the first pattern forming region such that the imprint material on the partial region of the first pattern forming region and the portion of protruding imprint material formed outside of the first pattern forming region are not cured by the first exposure process;
• a second pattern forming process, performed after the first pattern forming process, of arranging an imprint material on a second pattern forming region on the substrate and bringing the mold into contact with (i) an imprint material on the second pattern forming region on the substrate to form a second pattern (ii) with the portion of protruding imprint material formed outside of the first pattern forming region, and (iii) with the imprint material on the partial region of the first pattern forming region, the second pattern forming region and the first pattern forming region being horizontally-adjacent pattern forming regions on the substrate;
• a second exposure process of (i) exposing the imprint material on the second pattern forming region in which the second pattern has been formed by the second pattern forming process, and (ii) exposing the uncured imprint material on the partial region of the first pattern forming region;
• and
• a development process of developing the substrate on which the first and second patterns have been formed by the first and second pattern forming processes.