Apparatus for manufacturing a display device and a method for manufacturing the display device

A method for manufacturing a display device, comprising:

• preparing a laser device including a beam shaper and a laser module configured to provide a laser beam to the beam shaper, wherein the beam shaper is configured to:
• control a first energy profile of the laser beam and a second energy profile of the laser beam,
• provide the laser beam to a first irradiation surface according to the first energy profile, and
• provide the laser beam to a second irradiation surface different from the first irradiation surface according to the second energy profile, wherein the second irradiation surface is parallel to the first irradiation surface;
• preparing a substrate to which a protective film including a film portion and an adhesive portion is attached;
• providing the laser beam to the second irradiation surface according to the second energy profile;
• and
• forming an active area of the protective film and a dummy area of the protective film by irradiating a laser beam from the laser device through the protective film at the first irradiation surface according to the first energy profile, wherein the irradiating removes the film portion and the adhesive portion,
• wherein, between the apparatus and the first irradiation surface, the laser beam consists of a first portion, a second portion, and a focal point separating the first portion and the second portion, the first portion and the second portion omitting one or more focal points of the laser beam,
• wherein the second irradiation surface is disposed between the focal point of the laser beam and the first irradiation surface,
• wherein the first energy profile includes a first relative minimum energy at a perimeter of the laser beam, a second relative minimum energy at a center of the laser beam, and a first relative maximum energy at a point on the first irradiation surface between the perimeter of the laser beam and the center of the laser beam,
• wherein the second relative minimum energy is zero,
• wherein the second energy profile includes a third relative minimum energy at the perimeter of the laser beam, a second relative maximum energy at the center of the laser beam, a fourth relative minimum energy at a first point on the second irradiation surface between the center of the laser beam and the perimeter of the laser beam, and a third relative maximum energy at a second point on the second irradiation surface between the perimeter of the laser beam and the first point on the second irradiation surface, and
• wherein the dummy area of the protective film is configured to be peeled from the substrate.