Apparatus trapping an exhaust material from a substrate-processing process and apparatus for processing a substrate including the trapping apparatus
AssigneeSamsung Electronics Co., Ltd.
InventorsUihyoung Lee, Suji Gim, Hongsik Park, Taeheon Lee
Life of this patent
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Abstract
An apparatus for trapping an exhaust material from a substrate-processing process includes: a cyclone configured to provide the exhaust material with a swirling flow, wherein the exhaust material is discharged from the substrate-processing process using a reaction gas; an atomization module for providing the cyclone with a mist to convert the exhaust material into a powder through a wet oxidation reaction; and a collector configured to collect the powder.
Claims18
An apparatus for trapping an exhaust material from a substrate-processing process, the apparatus comprising:
- a cyclone configured to provide the exhaust material with a swirling flow, wherein the exhaust material is discharged from the substrate-processing process using a reaction gas;
- an atomization module for providing the cyclone with a mist to convert the exhaust material into a powder through a wet oxidation reaction;
- and
- a collector configured to collect the powder,
- wherein the atomization module includes:
- an atomizer configured to form the mist;
- a water supply module configured to supply water to the atomizer and to measure a flux of the water supplied to the atomizer;
- a compressed gas supply module configured to supply a compressed gas to the atomizer and to measure a pressure of the compressed gas supplied to the atomizer;
- a density transmitter configured to measure a density of the mist provided from the atomizer to the cyclone;
- and
- a density controller configured to control the density of the mist formed by the atomizer based on data of the flux of water that received from the water supply module, data of pressure of compressed gas that is received from the compressed gas supply module, and data of the density of the mist that is received from the density transmitter.
An apparatus for processing a substrate, the apparatus comprising:
- a reaction chamber configured to process the substrate by using a reaction gas;
- a vacuum pump configured to provide the reaction chamber with vacuum to discharge an exhaust material from the reaction chamber;
- a cyclone connected to the reaction chamber and the vacuum pump and configured to provide the exhaust material with a swirling flow;
- an atomization module providing the cyclone with a mist to convert the exhaust material into a powder through a wet oxidation reaction;
- and
- a collector configured to collect the powder from the cyclone,
- wherein the atomization module includes:
- an atomizer configured to form the mist;
- a water supply module configured to supply water to the atomizer and to measure a flux of the water supplied to the atomizer;
- a compressed gas supply module configured to supply a compressed gas to the atomizer and to measure a pressure of the compressed gas supplied to the atomizer;
- a density transmitter configured to measure a density of the mist provided from the atomizer to the cyclone;
- and
- a density controller configured to control the density of the mist formed by the atomizer based on data of the flux of water that received from the water supply module, data of pressure of compressed gas that is received from the compressed gas supply module, and data of the density of the mist that is received from the density transmitter.
Dependencies are inferred from the claim text.