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US 12,387,927 B2Granted
Deposition of boron films
AssigneeApplied Materials, Inc.
InventorsYung-Chen Lin, Chi-I Lang, Ho-yung David Hwang
Life of this patent
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Abstract
Methods for depositing boron-containing films on a substrate are described. The substrate is exposed to a boron precursor and a plasma to form the boron-containing film (e.g., elemental boron, boron oxide, boron carbide, boron silicide, boron nitride). The exposures can be sequential or simultaneous. The boron-containing films are selectively deposited on one material (e.g., SiN or Si) rather than on another material (e.g., silicon oxide).
Claims19
A method of depositing a boron-containing film, the method comprising:
- exposing a device to a boron precursor to deposit a film on the device, the device comprising a substrate, a first material directly on a top surface of the substrate, a second material directly on a top surface of the first material, and at least one feature formed within the first material and the second material, the at least one feature having at least one sidewall comprising the first material and the second material and a bottom surface comprising the first material, the first material comprising one or more of an oxygen containing compound, a metal oxide, carbon, and a nitride, the film selectively depositing on an exposed surface of the second material and not on exposed surfaces of the first material;
- and
- exposing the device to a plasma to react with the film to form the boron-containing film.
A method of depositing a film, the method comprising:
- exposing a device to a boron precursor to deposit a film on the device, the device comprising a substrate, a first material, at least one feature having at least one sidewall, and a second material directly on a top surface of the substrate, the first material directly on the at least one sidewall and comprising one or more of an oxygen containing compound, a metal oxide, carbon, and a nitride, the boron-containing film selectively depositing on a top surface of the second material adjacent to the first material.
Dependencies are inferred from the claim text.