Systems and methods for generating post-polishing topography for enhanced wafer manufacturing
AssigneeGlobalWafers Co., Ltd.
InventorsVahid Khalajzadeh, Sumeet S. Bhagavat
Life of this patent
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Abstract
A computer device is programmed to store a model for converting shape maps to simulate a portion of an assembly line, receive scan data of a first inspection of a product being assembled, generate a shape map from the scan data of the first inspection, execute the model using the shape map as an input to generate a final shape map of the product, compare the final shape map to one or more thresholds, determine if the final shape map exceeds at least one of the one or more thresholds, and if the determination is that the final shape map exceeds at least one of the one or more thresholds, cause the first device to be adjusted.
Claims20
A computer device comprising at least one processor in communication with at least one memory device, wherein the at least one processor is programmed to:
- store, in the at least one memory device, a model for converting shape maps to simulate a portion of an assembly line, wherein the model is a generative adversarial network (GAN) artificial intelligence model;
- receive scan data of a first inspection of a product being assembled, wherein the first inspection is conducted at a first inspection station in the assembly line subsequent to a first device in the assembly line, wherein the first device is a grinder;
- generate a shape map from the scan data of the first inspection;
- execute the model using the shape map as an input to generate a final shape map of the product;
- compare the final shape map to one or more thresholds;
- determine if the final shape map exceeds at least one of the one or more thresholds;
- and
- if the determination is made that the final shape map exceeds at least one of the one or more thresholds, cause the grinder to be adjusted.
A method for analyzing an assembly line, the method implemented by a computing device including at least one processor in communication with at least one memory device, the method comprising:
- storing, in the at least one memory device, a model for simulating a portion of an assembly line, wherein the model is a generative adversarial network (GAN) artificial intelligence model;
- storing, in the at least one memory device, a model for converting shape maps to simulate a portion of an assembly line;
- receiving scan data of a first inspection of a product being assembled, wherein the first inspection is conducted at a first inspection station in the assembly line subsequent to a first device in the assembly line, wherein the first device is a grinder;
- generating a shape map from the scan data of the first inspection;
- executing the model using the shape map as an input to generate a final shape map of the product;
- comparing the final shape map to one or more thresholds;
- determining if the final shape map exceeds at least one of the one or more thresholds;
- and
- if the determination is made that the final shape map exceeds at least one of the one or more thresholds, causing the grinder to be adjusted.
Dependencies are inferred from the claim text.