Stage device, lithography apparatus, and article manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorSatoshi Iwatani
Life of this patent
Estimating the term…
Abstract
A stage device includes a stage capable of moving in a first direction and a second direction orthogonal to each other, a scale arranged in the stage so as to extend in the first direction, an optical assembly arranged so as to face the scale in at least a part of a movable range of the stage and extending in the second direction, and an interferometer configured to transmit measurement light and reference light to the optical assembly, and receive the measurement light and the reference light returning from the optical assembly. The optical assembly is configured to apply the measurement light from the interferometer to the scale, and return the measurement light returning from the scale and the reference light to the interferometer.
Claims15
A stage device comprising:
- a stage capable of moving in a first direction and a second direction orthogonal to each other;
- a scale arranged in the stage so as to extend in the first direction;
- an optical assembly arranged so as to face the scale in at least a part of a movable range of the stage and extending in the second direction;
- and
- an interferometer configured to transmit measurement light and reference light to the optical assembly, and receive the measurement light and the reference light returning from the optical assembly,
- wherein the optical assembly is configured to apply the measurement light from the interferometer to the scale, and return the measurement light returning from the scale and the reference light to the interferometer, and
- wherein the optical assembly comprises optical parts each having an elongated shape extending in the second direction and integrated to form an assembly including a beam splitter/combiner and a first retroreflector which are extending in the second direction.
Dependencies are inferred from the claim text.