Film formation apparatus

A film formation apparatus comprising:

• a chamber which an interior thereof can be made vacuum;
• a rotary table provided inside the chamber, holding a workpiece, and circulating and transporting the workpiece in a circular trajectory;
• a film formation unit including a target formed of film formation material containing and a plasma generator which turns sputtering gas introduced between the target and the rotary table into plasma, wherein the film formation unit deposits by sputtering particles of the film formation material on the workpiece circulated and transported by the rotary table;
• and
• a film processing unit processing the film deposited on the workpiece in the film formation unit circulated and transported by the rotary table in the film formation unit,
• wherein the rotary table comprises
• a plurality of holding regions which holds each workpiece and which is provided in a film formation region that is an annular region in the rotary table other than a rotary shaft facing the film formation unit and the film processing unit,
• a heater arranged between the rotary table and the workpiece in each of the plurality of the holding regions to heat the workpiece on each of the plurality of the holding regions, and
• a heat insulator arranged between the rotary table and the heater in at least one of the plurality of holding regions.