Robot for transferring substrate and apparatus for treating substrate

A substrate treating apparatus comprising:

• a liquid bath having a storage space for filling a liquid within;
• a support unit configured to support a plurality of substrates positioned in a first posture within the storage space;
• and
• a transfer unit configured to transfer a substrate from the support unit one at a time, and which is provided to change a posture of the substrate from the first posture to a second posture, and
• wherein the first posture is a posture that a top surface of the substrate is horizontal to the ground and the second posture is a posture that a top surface of the substrate is perpendicular to the ground, and
• the transfer unit includes:
• a fastening body;
• a support body which protrudes from the fastening body to a front and which supports a bottom surface of the substrate if substrate is positioned in the first posture;
• a gripper member which is coupled the fastening body and which is relatively movable with respect to the support body;
• a gripper driver which moves the gripper member between a first position and a second position, and
• wherein the gripper member includes:
• a first gripper positioned at a side of the support body;
• and
• a second gripper positioned at another side of the support body, and
• wherein an alignment pin for aligning a position of the substrate by upwardly protruding from an end of the support body is installed at the support body, and
• if a position at which the substrate is aligned with the support body is referred to as a reference position of the substrate, the first position is a position at which the first gripper and the second gripper contact the substrate positioned at the reference position, and
• the second position is a position at which the first gripper and the second gripper are spaced apart from the substrate positioned at the reference position.

A substrate treating apparatus comprising:

• a first process treating unit having a liquid treating bath for treating a plurality of substrates at once in a first posture;
• and
• a second process treating unit having a liquid treating chamber for treating a substrate one at a time in a second posture, and
• wherein the first process treating unit includes:
• a liquid treating bath for liquid treating the plurality of substrates provided in the first posture by immersing in a treating liquid;
• a standby bath for standing by the plurality of substrates treated in the liquid treating bath in a rinsing liquid in the first posture;
• a transfer unit for transferring the plurality of substrates standing by in the standby bath one at a time to the second process treating unit, which is provided to change a posture of the substrate from the second posture to the first posture, and
• wherein the first posture is a posture that a top surface of the substrate is horizontal to the ground and the second posture is a posture that a top surface of the substrate is perpendicular to the ground, and
• the transfer unit includes:
• a fastening body;
• a support body which protrudes from the fastening body to a front and which supports a bottom surface of the substrate if substrate is positioned in the first posture;
• a gripper member which is coupled the fastening body and which is relatively movable with respect to the support body;
• a gripper driver which moves the gripper member between a first position and a second position, and
• wherein the gripper member includes:
• a first gripper positioned at a side of the support body;
• and
• a second gripper positioned at another side of the support body, and
• wherein an alignment pin for aligning a position of the substrate by upwardly protruding from an end of the support body is installed at the support body, and
• if a position at which the substrate is aligned with the support body is referred to as a reference position of the substrate, the first position is a position at which the first gripper and the second gripper contact the substrate positioned at the reference position, and
• the second position is a position at which the first gripper and the second gripper are spaced apart from the substrate positioned at the reference position.