# US 12,379,669 B2 · Massive overlay metrology sampling with multiple measurement columns > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,379,669 B2 - Document ID: US12379669B2 - Status: Granted - Kind: B2 - Application number: 18/376,703 - Filed: 2023-10-04 - Published: 2024-01-25 - Granted: 2025-08-05 - Earliest claimed: 2020-11-20 - Assignees: KLA Corporation - Applicants: KLA Corporation - Inventors: Jonathan Madsen; Andrei V. Shchegrov; Amnon Manassen; Andrew V. Hill; Yossi Simon; Gilad Laredo; Yoram Uziel - Web page: https://patentgrep.com/patent/US12379669B2 ## CPC - G03F 7/70633: {Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching} - G03F 7/70653: {Metrology techniques} - G03F 7/706843: {Metrology apparatus} - G03F 7/706845: {Calibration, e.g. tool-to-tool calibration, beam alignment, spot position or focus} - G03F 9/7084: {Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels} - G01N 21/95684: {Patterns showing highly reflecting parts, e.g. metallic elements} - H01J 37/3045: {Object or beam position registration} - H01J 37/3177: {Multi-beam, e.g. fly's eye, comb probe} - H01J 2237/31764: Dividing into sub-patterns - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - G01N: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing apparatus or processes other than immunoassay, involving enzymes or microorganisms C12M, C12Q) - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) ## Abstract A multi-column metrology tool may include two or more measurement columns distributed along a column direction, where the two or more measurement columns simultaneously probe two or more measurement regions on a sample including metrology targets. A measurement column may include an illumination sub-system to direct illumination to the sample, a collection sub-system including a collection lens to collect measurement signals from the sample and direct it to one or more detectors, and a column-positioning sub-system to adjust a position of the collection lens. A measurement region of a measurement column may be defined by a field of view of the collection lens and a range of the positioning system in the lateral plane. The tool may further include a sample-positioning sub-system to scan the sample along a scan path different than the column direction to position metrology targets within the measurement regions of the measurement columns for measurements. ## Claims ### Claim 1 A multi-column metrology tool comprising: two or more measurement columns distributed along a column direction, wherein the two or more measurement columns are configured to simultaneously probe two or more measurement regions on a sample including a plurality of metrology targets, wherein the two or more measurement regions are distributed along the column direction with gaps therebetween, wherein a particular measurement column of the two or more measurement columns comprises: an illumination sub-system including one or more lenses configured to direct illumination from at least one of one or more illumination sources to the sample; and a collection sub-system including a collection lens configured to collect measurement signals from the sample and direct the measurement signals to one or more detectors; and a sample-positioning sub-system including one or more actuators configured to scan the sample along two or more scan paths along directions different than the column direction, wherein each of the two or more scan paths positions metrology targets of the plurality of metrology targets within the two or more measurement regions of the two or more measurement columns for measurements, wherein the sample is moved along the column direction between the two or more scan paths to provide coverage of at least some of the gaps between the two or more measurement regions. ### Claim 2 (depends on 1) The multi-column metrology tool of claim 1, wherein at least one of the two or more measurement columns collects the measurement signals from two or more measurement planes and directs the measurement signals from the two or more measurement planes to at least one of the one or more detectors. ### Claim 3 (depends on 1) The multi-column metrology tool of claim 1, wherein the sample-positioning sub-system is further configured to adjust a position of the sample along an axial direction normal to a plane of the sample. ### Claim 4 (depends on 1) The multi-column metrology tool of claim 1, wherein the sample-positioning sub-system includes a rotation stage to rotate the sample. ### Claim 5 (depends on 1) The multi-column metrology tool of claim 1, wherein at least one of the one or more detectors comprise moveable detectors located on at least one of the two or more measurement columns. ### Claim 6 (depends on 1) The multi-column metrology tool of claim 1, wherein at least one of the one or more illumination sources comprise moveable illumination sources located on at least one of the two or more measurement columns. ### Claim 7 (depends on 1) The multi-column metrology tool of claim 1, wherein at least one of the one or more illumination sources comprises an electromagnetic illumination source. ### Claim 8 (depends on 1) The multi-column metrology tool of claim 1, wherein at least one of the one or more illumination sources comprises a particle-beam illumination source. ### Claim 9 (depends on 1) The multi-column metrology tool of claim 1, wherein at least one of the two or more measurement columns is configured to perform a measurement on at least one of the plurality of metrology targets as the sample is moving along the two or more scan paths. ### Claim 10 (depends on 1) The multi-column metrology tool of claim 1, wherein at least one of the two or more measurement columns is configured to perform the measurements as the sample is stationary. ### Claim 11 (depends on 1) The multi-column metrology tool of claim 1, wherein the two or more scan paths are linear, wherein at least some of the plurality of metrology targets are linearly arranged to be measured by at least some of the two or more measurement columns as the sample is scanned along the two or more scan paths. ### Claim 12 (depends on 1) The multi-column metrology tool of claim 1, wherein a spatial extent of the two or more measurement columns along the column direction corresponds to a size of a desired measurement area on the sample. ### Claim 13 (depends on 1) The multi-column metrology tool of claim 1, wherein sizes of measurement areas of the one or more detectors along the column direction sum to at least 10% of a size of the sample along the column direction. ### Claim 14 (depends on 1) The multi-column metrology tool of claim 1, wherein the collection lens comprises: an objective lens. ### Claim 15 (depends on 1) The multi-column metrology tool of claim 1, wherein the metrology targets comprise: dedicated metrology targets. ### Claim 16 (depends on 1) The multi-column metrology tool of claim 1, wherein the metrology targets comprise: device features on the sample. ### Claim 17 (depends on 1) The multi-column metrology tool of claim 1, wherein the metrology targets are formed from at least one of after-development features, after-etch features, or after-cleaning features. ### Claim 18 (depends on 1) The multi-column metrology tool of claim 1, wherein at least one of the one or more illumination sources comprises a fixed illumination source located external to the two or more measurement columns. ### Claim 19 (depends on 18) The multi-column metrology tool of claim 18, wherein at least two of the two or more measurement columns receive the illumination from the fixed illumination source. ### Claim 20 (depends on 18) The multi-column metrology tool of claim 18, wherein at least one of the two or more measurement columns receives the illumination from the fixed illumination source through one or more optical fibers. ### Claim 21 (depends on 1) The multi-column metrology tool of claim 1, wherein at least one of the one or more detectors comprises a fixed detector located external to the two or more measurement columns. ### Claim 22 (depends on 21) The multi-column metrology tool of claim 21, wherein the measurement signals provided by at least two of the two or more measurement columns are multiplexed by one or more parameters. ### Claim 23 (depends on 22) The multi-column metrology tool of claim 22, wherein the one or more parameters comprise: at least one of polarization, wavelength, or time. ### Claim 24 (depends on 22) The multi-column metrology tool of claim 22, wherein the fixed detector provides separate detector data associated with the measurement signals provided by the at least two of the two or more measurement columns that are multiplexed by the one or more parameters. ### Claim 25 (depends on 22) The multi-column metrology tool of claim 22, further comprising: a detection demultiplexer configured to receive the measurement signals from the at least two of the two or more measurement columns and generate two or more demultiplexed measurement signals, wherein the detection demultiplexer further distributes the two or more demultiplexed measurement signals to the fixed detector. ### Claim 26 (depends on 22) The multi-column metrology tool of claim 22, wherein the illumination received by the at least two of the two or more measurement columns is multiplexed by the one or more parameters. ### Claim 27 (depends on 21) The multi-column metrology tool of claim 21, wherein at least one of the two or more measurement columns directs the measurement signals through one or more optical fibers. ### Claim 28 A multi-column metrology method comprising: providing illumination to two or more measurement columns, wherein the two or more measurement columns are configured to simultaneously probe two or more measurement regions on a sample including a plurality of metrology targets as the sample is scanned along two or more scan paths, wherein the two or more measurement regions are distributed along a column direction with gaps therebetween, wherein the sample is moved along the column direction between the two or more scan paths to provide coverage of at least some of the gaps, wherein the two or more scan paths are along directions different than the column direction, wherein a particular measurement column of the two or more measurement columns comprises: an illumination sub-system including one or more lenses configured to direct the illumination from at least one of one or more illumination sources to the sample; and a collection sub-system including a collection lens configured to collect measurement signals from the sample and direct the measurement signals to one or more detectors; directing the illumination to the plurality of metrology targets within measurement fields of view of the two or more measurement columns; collecting the measurement signals by the two or more measurement columns; detecting the measurement signals on the one or more detectors; and generating metrology data for the plurality of metrology targets within the measurement fields of view of the two or more measurement columns based on the measurement signals. ### Claim 29 (depends on 28) The multi-column metrology method of claim 28, wherein the measurement signals provided by at least two of the two or more measurement columns are multiplexed by one or more parameters. ### Claim 30 (depends on 29) The multi-column metrology method of claim 29, wherein the measurement signals provided by at least two of the two or more measurement columns are multiplexed by at least one of polarization, wavelength, or time. ### Claim 31 A multi-column metrology method comprising: generating a first set of calibration measurements of one or more calibration targets on a sample using one or more calibration measurement columns of a multi-column metrology tool; generating a second set of calibration measurements of the one or more calibration targets using one or more test measurement columns of the multi-column metrology tool, wherein the one or more test measurement columns provide different measurement accuracies than the one or more calibration measurement columns, wherein a particular calibration measurement column of the one or more calibration measurement columns or a particular test measurement column of the one or more test measurement columns comprises: an illumination sub-system including one or more lenses configured to direct illumination from at least one of one or more illumination sources to the sample; a collection sub-system including a collection lens configured to collect measurement signals from the sample and direct the measurement signals to one or more detectors; and a column-positioning sub-system including one or more actuators configured to adjust a position of the collection lens within a lateral plane parallel to a sample plane for a measurement, wherein a measurement region is defined by a field of view of the collection lens and a range of the column-positioning sub-system in the lateral plane; calibrating the one or more test measurement columns based on first and second sets of calibration measurements; and generating one or more calibrated measurements of one or more test targets different than the one or more calibration targets using the one or more test measurement columns. ### Claim 32 (depends on 31) The multi-column metrology method of claim 31, wherein the one or more illumination sources comprise: two or more illumination sources, wherein the one or more test measurement columns and the one or more calibration measurement columns receive the measurement signals from different illumination sources of the two or more illumination sources. ### Claim 33 (depends on 31) The multi-column metrology method of claim 31, wherein calibrating the one or more test measurement columns based on the first and second sets of calibration measurements comprises: identifying correlations between the first and second sets of calibration measurements for the one or more test targets; and training the one or more test measurement columns to generate metrology measurements based on the correlations.