Surface analysis device
AssigneeHitachi High-Tech Corporation
InventorsRitsuo Fukaya, Yasuhiro Ando, Yoshihiro Isozaki
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AssigneeHitachi High-Tech Corporation
InventorsRitsuo Fukaya, Yasuhiro Ando, Yoshihiro Isozaki
Estimating the term…
The present invention pertains to a surface analysis device (1) and provides a technology that can increase accuracy and quality of measurement and analysis even when a local deviation is generated in height information of a measurement result of a scanning probe microscope (SPM) (2), due to an atmospheric pressure change with respect to an airtight tank (10). The surface analysis device (1) is provided with: an airtight tank (10); a stage (6) that holds a sample (5) in the airtight tank (10); the SPM (2) that is fixed to a structure configuring the airtight tank (1) and that measures the surface of the sample (5); a sensor (4) that is disposed outside of the airtight tank (10) and that measures atmospheric pressure; and a computer system that analyzes the surface of the sample by using a first signal obtained through measurement by the SPM (2) and a second signal obtained through measurement by the sensor (4).
A surface analysis device comprising:
Dependencies are inferred from the claim text.