Method of preparing multicomponent nanopattern

A method of preparing a multicomponent nanopattern of mixture of multicomponent material comprising sequential steps (a) and (b):

• (a) depositing a film including homogeneous mixture of a multicomponent material selected from the group consisting of two or more polymers;
• two or more metals;
• two or more metal oxides;
• and two or more metal sulfides, on a substrate having a prepattern formed thereon;
• and
• (b) forming the multicomponent nanopattern of mixture of multicomponent material by re-depositing the mixture of the multicomponent material from the film deposited in step (a) on a side surface of the prepattern through an ion etching process,
• wherein steps (a) and (b) are carried out to form a multilayer structure of layers of the homogeneous mixture of the multicomponent material on the substrate prepattern and side surface of the prepattern,
• wherein the film deposited in step (a) for each layer has a film thickness of 5 nm or less,
• wherein the metal is selected from the group consisting of Au, Ag, Cu, Al, Ni, Pt, Pd, Sn, Mo, Ti, Cr, Mn, Fe, Co, Zn, In, W, Ir and Si, and
• wherein multicomponent material is mixed using secondary sputtering phenomenon and internal composition and structure of resulting nanopattern is controlled according to a film composition before the ion etching process.