Methods of reducing friction on a surface of an apparatus that stores or transports a gas
AssigneeAculon, Inc.
InventorsEric L. Hanson, Eric L. Bruner, Majid Monji, Elizabeth Cambre, Edward Hughes
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AssigneeAculon, Inc.
InventorsEric L. Hanson, Eric L. Bruner, Majid Monji, Elizabeth Cambre, Edward Hughes
Estimating the term…
The present invention provides methods of reducing friction on a surface of an apparatus that stores or transports a gas, comprising: (a) contacting the surface either directly or through an intermediate organometallic layer with a fluorinated material in a diluent, wherein the fluorinated material has the following structure: wherein A is an oxygen radical or a chemical bond; n is 1 to 20; Y is H, F, CnH2n+1 or CnF2n+1; X is H or F; b is at least 1, m is 0 to 50, p is 1 to 20, and Z is an acid group or an acid derivative; (b) forming a hydrophobic surface layer on the surface; and (c) introducing the gas into the apparatus.
A method of reducing friction on a metal surface of an apparatus that stores or transports a gas, the method comprising:
A method of reducing friction on a metal surface of an apparatus that stores or transports a gas, the method comprising:
A method of reducing friction on a metal surface of an apparatus that stores or transports a gas, the method comprising:
Dependencies are inferred from the claim text.