Methods of forming nanostructures utilizing self-assembled nucleic acids
AssigneeMicron Technology, Inc.
InventorGurtej S. Sandhu
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Abstract
A method of forming a structure comprises forming a pattern of self-assembled nucleic acids over a material. The pattern of self-assembled nucleic acids is exposed to at least one repair enzyme to repair defects in the pattern. The repaired pattern of self-assembled nucleic acids is transferred to the material to form features therein. A method of decreasing defect density in self-assembled nucleic acids is also disclosed. Self-assembled nucleic acids exhibiting an initial defect density are formed over at least a portion of a material and the self-assembled nucleic acids are exposed to at least one repair enzyme to repair defects in the self-assembled nucleic acids. Additional methods are also disclosed.
Claims20
A method of decreasing defect density in self-assembled nucleic acids, the method comprising:
- forming an initial pattern of self-assembled nucleic acids on a material, the initial pattern of self-assembled nucleic acid comprising one or more defects;
- exposing the initial pattern of self-assembled nucleic acids to at least one enzyme to repair at least one of the one or more defects in the initial pattern of self-assembled nucleic acids;
- and
- removing a portion of the material exposed through the repaired pattern of self-assembled nucleic acids.
A method of decreasing defect density in self-assembled nucleic acids, the method comprising:
- forming a pattern of self-assembled nucleic acids on a base material;
- determining a defect density in the pattern of self-assembled nucleic acids;
- exposing the pattern of self-assembled nucleic acids to at least one enzyme to repair at least one defect in the pattern of self-assembled nucleic acids;
- and
- removing one or more materials exposed through the repaired pattern of self-assembled nucleic acids.
A method of forming a nanostructure, comprising:
- forming a self-assembled structure of nucleic acids on a base material;
- determining the self-assembled structure of nucleic acids comprises at least one defect;
- exposing the self-assembled structure of nucleic acids to at least one enzyme to repair the at least one defect in the self-assembled structure;
- and
- transferring a pattern of the repaired self-assembled structure to one or more materials adjacent to the base material.
Dependencies are inferred from the claim text.