Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systems

A method of adjusting a phase shift between pixels in digital lithography systems, the method comprising:

• projecting a first light beam onto a substrate during a digital lithography process, wherein the first light beam comprises a plurality of components comprising:
• a first component having a first wavelength that generates a first phase shift that is greater than a preselected phase shift;
• and
• a second component having a second wavelength that generates a second phase shift that is less than the preselected phase shift;
• projecting a second light beam onto the substrate during the digital lithography process;
• and
• controlling intensities of the plurality of components to generate an effect on the substrate that approximates the preselected phase shift.

A method of adjusting or selecting a phase shift between pixels in digital lithography systems, the method comprising:

• projecting or directing a first light beam onto a substrate during a digital lithography process;
• projecting or directing a second light beam onto the substrate during the digital lithography process, wherein the second light beam is adjacent to the first light beam on the substrate;
• and
• controlling a wavelength of the first light beam and/or a wavelength of the second light beam based on an optical path difference between the first light beam and the second light beam to produce a preselected phase shift between the first light beam and the second light beam on the substrate.