Optical property measurement apparatus and optical property measurement method
AssigneeHamamatsu Photonics K.K.
InventorsHisanari Takahashi, Koyo Watanabe, Hiroshi Satozono, Kyohei Shigematsu, Takashi Inoue
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AssigneeHamamatsu Photonics K.K.
InventorsHisanari Takahashi, Koyo Watanabe, Hiroshi Satozono, Kyohei Shigematsu, Takashi Inoue
Estimating the term…
An optical property measurement apparatus includes a pulse formation unit, a waveform measurement unit, and an optical system. The pulse formation unit is capable of changing a temporal waveform of pulsed light in accordance with a type of optical property to be measured. The waveform measurement unit measures a temporal waveform of the pulsed light output from a measurement object after being incident on the measurement object. The optical system has an attenuation unit with an attenuation rate with respect to one wavelength component constituting the pulsed light larger than an attenuation rate with respect to another wavelength component constituting the pulsed light. The optical system is capable of switching between a first state in which the attenuation unit is arranged on an optical path of the pulsed light output from the measurement object and a second state in which the attenuation unit is not arranged on the optical path.
An optical property measurement apparatus for measuring optical properties of a measurement object, the optical property measurement apparatus comprising:
An optical property measurement method for measuring optical properties of a measurement object by irradiating the measurement object with pulsed light, the optical property measurement method comprising:
Dependencies are inferred from the claim text.