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US 12,370,648 B2Granted
Surface clean system and method
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsPei-Yi Su, Cheng-Chieh Chen
Life of this patent
Estimating the term…
Abstract
A portable handheld cleaning device is provided capable of cleaning the surface of the substrate table without damaging the surface. The portable handheld cleaning device in accordance with the present disclosure includes a base having a first side and a second side (the first side and the second side overlapping each other), a hollow structure on the first side of the base, and a weight holding space within the hollow structure. A grinding pad is provided on the second side of the base. The grinding pad includes a cleaning surface, the cleaning surface having a plurality of substantial pyramid shaped grits.
Claims20
A portable cleaning device, comprising:
- a base having a first side and a second side opposite to the first side, the first side and the second side are aligned with each other along a vertical direction, and the first side and the second side face away from each other;
- a hollow structure defined by the first side of the base and a sidewall that extends upward from the base, and the hollow structure includes a weight holding space delimited by the sidewall and the base;
- at least one weight alignment structure within the weight holding space, wherein the weight alignment structure is a post that extends upwards from the base;
- and
- a grinding pad adjacent to the second side of the base,
- wherein the grinding pad includes a cleaning surface, the cleaning surface having a plurality of structures substantially shaped like pyramids, and the cleaning surface is configured to, in operation, clean a respective surface of a respective semiconductor substrate table, and
- wherein the post of the at least one weight alignment structure includes threads configured to, in operation, threadedly engage with one or more weight members.
4 more elements
A portable cleaning device, comprising:
- a base having a first side and a second side opposite to the first side, the first side and the second side are aligned with each other along a vertical direction, and the first side and the second side face away from each other;
- a hollow structure defined by the first side of the base and a sidewall that extends upward from the base, and the hollow structure includes a weight holding space, the weight holding space is delimited by the base and the sidewall of the hollow structure;
- at least one alignment structure within the weight holding space, wherein the weight alignment structure is a post that extends upwards from the base, the post is configured to, in operation, receive one or more weight members aligning the one or more weight members within the weight holding space;
- and
- a grinding pad adjacent to the second side of the base, the grinding pad includes:
- a grinding pad base;
- and
- a plurality of structures coupled to the grinding pad base, the plurality of structures protruding outwards and away from the grinding pad base, the plurality of structures are configured to, in operation, clean the respective surface of the respective semiconductor substrate table,
- wherein the post of the at least one weight alignment structure includes threads configured to, in operation, threadedly engage with the one or more weight members within the weight holding space and along the post of the at least one weight alignment structure.
6 more elements
A portable cleaning device, comprising:
- a base having a first side and a second side opposite to the first side, the first side and the second side are aligned with each other along a vertical direction, and the first side and the second side face away from each other;
- a hollow structure defined by the first side of the base and a sidewall that extends upward from the base, the hollow structure includes a weight holding space, the weight holding space is delimited by the base and the sidewall of the hollow structure;
- a grinding pad adjacent to the second side of the base, the grinding pad includes a cleaning surface, and the cleaning surface has a plurality of structures substantially shaped like pyramids, the plurality of structures substantially shaped like pyramids are configured to, in operation, clean a respective surface of a respective semiconductor substrate table;
- and
- at least one weight alignment structure within the weight holding space, the at least one weight alignment structure is a post that extends upwards from the base;
- at least one indicator along the post of the at least one weight alignment structure, the at least one indicator indicates a maximum dimension of one or more weight members configured to, in operation, be placed within the weight holding space, and
- wherein the post of the at least one weight alignment structure includes threads configured to, in operation, threadedly engage with one or more weight members.
4 more elements
Dependencies are inferred from the claim text.