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US 12,366,801 B2Granted
Process for transfer imprinting
AssigneeArkema France
InventorsChristophe Navarro, Celia Nicolet, Xavier Chevalier, Florian Delachat, Hubert Teyssedre
Life of this patent
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Abstract
A process for transfer imprinting using a novel family of anti-sticking layers, such as for nanoimprint lithography processes, is described.
Claims10
An imprint obtained by
- deposition of an anti-sticking layer on a template, optionally first treated by an adhesion primer (surface activation plasma), the anti-sticking layer comprising a homopolymer or a copolymer having at least one covalent bond that generates free radicals when the homopolyer or copolymer is activated thermally, by organic or inorganic redox, photochemically, by shearing, by plasma, or under the influence of ionizing radiation, the homopolymer or copolymer having a surface energy of greater than 5 mN/m, an elastic modulus E′ of greater than 1000 MPa at 25° C., and a weight-average molecular weight of greater than 500 g/mol,
- activation of the covalent bond that generates free radicals thermally, by organic or inorganic redox, photochemically, by shearing, by plasma, or under the influence of ionizing radiation to form a film with a thickness of less than 50 nm on the template,
- deposition or lamination of a polymer resin with a thickness ranging from 100 nm to 5 mm,
- polymerization or cooling of the resin serving as imprint,
- removing the imprint.
2 more elements
Dependencies are inferred from the claim text.