Reflector plate for substrate processing
AssigneeApplied Materials, Inc.
InventorWolfgang R. Aderhold
Life of this patent
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Abstract
Embodiments of the present disclosure generally relate to apparatus for processing a substrate, and more specifically to reflector plates for rapid thermal processing. In an embodiment, a reflector plate assembly for processing a substrate is provided. The reflector plate assembly includes a reflector plate body, a plurality of sub-reflector plates disposed within the reflector plate body, and a plurality of pyrometers. A pyrometer of the plurality of pyrometers is coupled to an opening formed in a sub-reflector plate. Chambers including a reflector plate assembly are also described herein.
Claims20
A reflector plate assembly for processing a substrate, comprising:
- a base reflector plate having a plurality of sub-reflector plates embedded therein;
- and
- a sectioned cover comprising a first cover and a second cover, wherein the first cover is disposed over a first portion of the base reflector plate, and the second cover comprises a plurality of raised sections, the raised sections extending from the first cover and covering the plurality of sub-reflector plates.
A reflector plate assembly for processing a substrate, comprising:
- a base reflector plate body having a plurality of sub-reflector plates embedded therein;
- and
- a sectioned cover comprising a first cover and a second cover, wherein the first cover is disposed over the base reflector plate body, and the second cover is disposed over a portion of at least one sub-reflector plate, the second cover being separate from the first cover, the second cover extending to a higher elevation than the first cover.
Dependencies are inferred from the claim text.