Apparatus for processing a plurality of substrates provided with an extractor chamber

A system for processing a plurality of substrates, comprising;

• a process tube creating a process chamber;
• a heater surrounding the process tube for heating the process chamber;
• a flange for supporting the process tube and comprising a flange opening giving access to an opening of the process tube;
• a door configured to support, in the process chamber, a wafer boat with a plurality of substrates and to seal the process chamber;
• a first exhaust duct operably connected to the process chamber and configured to remove gas from the process chamber;
• an extractor chamber operably connected to a space between the process chamber and the heater and comprising:
• at least a portion of the first exhaust duct;
• at least a portion of a gas injection tube operably connected to the process chamber to provide process gas into the process chamber;
• a process gas production unit operably connected to the gas injection tube and configured to provide process gas into the process chamber;
• and
• a second exhaust duct configured to remove both first gas from the space and second gas leaked from the process gas production unit in the extractor chamber, wherein the second exhaust duct is not connected to the first exhaust duct, and wherein a first gas flow in the first exhaust duct is different from a second gas flow in the second exhaust duct.