Apparatus and method for forming a resist fine pattern

A method for forming a resist fine pattern, which forms a resist fine pattern on a substrate by using an inkjet printing method of printing an ink along a path, the method comprising:

• an ejecting process of, while simultaneously discharging a photocurable resist ink at a front side of the path and a partition-forming ink at a rear side of the path to be spaced apart from each other, applying optical energy to the discharged photocurable resist ink, wherein an intensity of light of the optical energy is set so that the photocurable resist ink is semi-cured and deposited on the substrate in a gelatinous state to form a vertical boundary with the partition-forming ink deposited on the substrate and simultaneously prevent the photocurable resist ink from being spread, thereby being cured after all of the photocurable resist ink and the partition-forming ink are completely deposited;
• after the ejecting process, a cleaning process of removing the partition-forming ink by cleaning with water;
• and
• an etching process of etching an area of the substrate except for a resist made of the photocurable resist ink, which is remained after the cleaning process.

An apparatus for forming a resist fine pattern, which forms a resist fine pattern on a substrate having the same surface energy by using an inkjet printing method of printing an ink along a path, the apparatus comprising:

• a first discharge head configured to discharge a first ink at a front side of the path;
• a second discharge head configured to discharge a second ink at a rear side of the path at the same time with the first discharge head;
• and
• a light irradiator configured to apply optical energy to the ink discharged from at least one of the first discharge head and the second discharge head,
• wherein the first ink is one of a photocurable resist ink and a partition-forming ink, and the second ink is the other thereof,
• an intensity of light of the light irradiator is set so that the photocurable resist ink in a is semi-cured and deposited on the substrate in a gelatinous state to form a vertical boundary with the partition-forming ink deposited on the substrate and simultaneously prevent the photocurable resist ink from being spread, thereby being cured after all of the photocurable resist ink and the partition-forming ink are completely deposited.