Element forming wafer and method for manufacturing the same
AssigneeDenso Corporation
InventorsAkihiko Teshigahara, Megumi Suzuki
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AssigneeDenso Corporation
InventorsAkihiko Teshigahara, Megumi Suzuki
Estimating the term…
A method for manufacturing an element forming wafer includes the steps of: forming a thin layer on a semiconductor wafer having a plurality of chip forming regions; and adjusting stress generated in an element forming portion of the thin layer to have a specified value. The thin layer constitutes an element in each of the plurality of chip forming regions. The step of adjusting the stress includes: arranging a resist on the thin layer; exposing the resist to light using a photomask having openings; forming openings in the resist by developing the resist; and performing ion-implantation using the resist as a mask. The photomask used during the step of exposing the resist to light has a ratio of the openings that is adjusted based on the stress generated in the element forming portion.
An element forming wafer, comprising:
Dependencies are inferred from the claim text.