Radio-frequency antenna and plasma processing device
AssigneesEmd Corporation, Tomoegawa Co., Ltd.
InventorsAkinori Ebe, Hajime Tsuda, Hideki Moriuchi
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AssigneesEmd Corporation, Tomoegawa Co., Ltd.
InventorsAkinori Ebe, Hajime Tsuda, Hideki Moriuchi
Estimating the term…
A radio-frequency antenna through which a high amount of current can be efficiently passed even at a radio-frequency level for plasma generation, as well as a plasma processing device utilizing the radio-frequency antenna. A radio-frequency antenna includes a metal fiber sheet. A plasma processing device includes: a vacuum container including a wall having an opening; a radio-frequency antenna including a metal fiber sheet and located at the opening; and a dielectric protection plate located closer to the interior of the vacuum container than the radio-frequency antenna and configured to close the opening in a gas-tight manner. The radio-frequency antenna including a metal fiber sheet has a larger surface area and a lower impedance to a radio-frequency current than a radio-frequency antenna including a metal plate having the same outer shape. Therefore, it allows a radio-frequency current commonly used for plasma generation to be more efficiently passed through in large amounts.
A radio-frequency antenna configured to generate a radio-frequency electromagnetic field in a vacuum container of a plasma processing device, the radio-frequency antenna comprising:
A plasma processing device, comprising:
Dependencies are inferred from the claim text.