Electrochromic cathode materials

An integrated deposition system for fabricating an electrochromic stack, the integrated deposition system comprising:

• a plurality of deposition stations aligned in series and interconnected and operable to pass a substrate from one station to the next without exposing the substrate to an external environment,
• wherein the plurality of deposition stations comprise
• a first deposition station containing a first one or more material sources for depositing an electrochromic layer comprising an electrochromic material comprising tungsten titanium molybdenum oxide having the composition W1-x-yTixMoyOz, where x is between about 0.05-0.25, y is between about 0.01-0.15, and z is between about 3.5-4.5, the electrochromic layer having a thickness between about 200-700 nm;
• a second deposition station containing a second one or more material sources for depositing a counter electrode layer comprising nickel tungsten oxide, the counter electrode layer having a thickness between about 100-400 nm;
• and
• a controller containing program instructions for passing the substrate through the plurality of deposition stations in a manner that deposits on the substrate
• (i) the electrochromic layer, and
• (ii) the counter electrode layer to form a stack comprising at least the electrochromic layer and the counter electrode layer, wherein the controller further contains program instructions for forming the stack without a homogenous layer of ion conducting, electronically insulating material between the electrochromic layer and the counter electrode layer.