Fabrication of MEMS structures from fused silica for inertial sensors

A method for forming a MEMS structure for an inertial sensor from fused silica, the method comprising:

• depositing a conductive layer on one or more selected regions of a first surface of a fused silica substrate;
• illuminating areas of the fused silica substrate with laser radiation in a pattern, the pattern defining features of the MEMS structure for an inertial sensor;
• depositing a masking layer at least on the one or more selected regions of the first surface of the fused silica substrate where the conductive layer has been deposited, wherein the masking layer is deposited such that the illuminated areas of the fused silica substrate remain exposed;
• and
• performing a first etch of the exposed areas of the fused silica substrate so as to selectively etch the pattern defining features of the MEMS structure for an inertial sensor.