Semiconductor device comprising insulated-gate bipolar transistor
AssigneeFuji Electric Co., Ltd.
InventorsYuichi Onozawa, Kota Ohi
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AssigneeFuji Electric Co., Ltd.
InventorsYuichi Onozawa, Kota Ohi
Estimating the term…
A device includes a substrate, a drift region in the substrate, a base region above the drift region; a first high concentration region selectively formed in a part on a surface side of the base region and having a concentration higher than the drift region; a trench portion formed in a front surface of the substrate and including extending portions; and mesa portions between the extending portions. The mesa portions includes first mesa portions having the first high concentration region and second mesa portions not having the first high concentration region, the trench portion includes a first trench portion having an first conductive portion (a gate conductive portion) and adjacent to the first mesa portion, a second trench portion having the first conductive portion and adjacent to the second mesa portion, and a third trench portion having an second conductive portion and adjacent to the first or second mesa portion.
A semiconductor device comprising a transistor portion, wherein the transistor portion includes:
A semiconductor device comprising a transistor portion, wherein the transistor portion includes:
Dependencies are inferred from the claim text.