Semiconductor device and method for manufacturing semiconductor device
AssigneeMitsubishi Electric Corporation
InventorsMotoshi Kitagawa, Kazumasa Kishimoto
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Abstract
A laminate (22) is formed on a semiconductor substrate (10). Two or more grooves (54) are formed in the laminate (22). A mesa (24) with two grooves among the two or more grooves (54) positioned on both sides is formed. An insulating resin film (30) is embedded into the two or more grooves (54). A first opening (32) is formed at the insulating resin film (30) embedded in one of the two or more grooves (54) and an electrode (46) extracted upward from a bottom surface (36) is formed. A first side surface (34) of the insulating resin film (30) is inclined in a forward tapered direction.
Claims8
A semiconductor device comprising:
- a semiconductor substrate;
- a laminate formed on the semiconductor substrate and including a first conductive type clad layer as a lowermost layer and a second conductive type clad layer as an uppermost layer, two or more grooves that are dug halfway to the first conductive type clad layer from an upper surface of the second conductive type clad layer being formed in the laminate;
- a mesa including a ridge waveguide including the first conductive type clad layer, an active layer and the second conductive type clad layer sequentially from a side closer to the semiconductor substrate, two grooves among the two or more grooves being positioned on both sides of the mesa;
- and
- an insulating resin film embedded into the two or more grooves,
- wherein a first opening having a bottom surface from which the first conductive type clad layer is exposed is formed at the insulating resin film embedded in one of the two or more grooves,
- an electrode connected to the first conductive type clad layer on the bottom surface and extracted above the insulating resin film along a first side surface that is in contact with the first opening, of the insulating resin film is formed,
- the first side surface is inclined in a forward tapered direction
- an insulating film is formed on the insulating resin film and the second conductive type clad layer,
- a second side surface that is continuous with the first side surface, of the insulating film is inclined in a forward tapered direction, and
- the electrode is extracted onto the insulating film along the second side surface.
A method for manufacturing a semiconductor device, comprising:
- sequentially forming a first conductive type clad layer, an active layer and a second conductive type clad layer on a semiconductor substrate;
- forming two or more grooves by performing etching halfway to the first conductive type clad layer from an upper surface of the second conductive type clad layer to form a mesa including a ridge waveguide including the first conductive type clad layer, the active layer and the second conductive type clad layer from a side closer to the semiconductor substrate, two grooves among the two or more grooves being positioned on both sides of the mesa;
- forming an insulating resin film to be embedded into the two or more grooves;
- forming an insulating film on the insulating resin film and the second conductive type clad layer;
- forming a second opening by etching the insulating film on the insulating resin film embedded into one groove among the two or more grooves and tilting a second side surface that is in contact with the second opening, of the insulating film in a forward tapered direction;
- forming a first opening by etching the insulating resin film under the second opening using the insulating film as a mask so that the first conductive type clad layer is exposed and tilting a first side surface that is in contact with the first opening, of the insulating resin film in a forward tapered direction;
- and
- forming an electrode connected to the first conductive type clad layer on a bottom surface of the first opening and extracted above the insulating resin film along the first side surface.
Dependencies are inferred from the claim text.